| Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching W Chiappim, BB Neto, M Shiotani, J Karnopp, L Gonçalves, JP Chaves, ... Nanomaterials 12 (19), 3497, 2022 | 7 | 2022 |
| A global model study of plasma chemistry and propulsion parameters of a gridded ion thruster using argon as propellant B Magaldi, J Karnopp, A da Silva Sobrinho, R Pessoa Plasma 5 (3), 324-340, 2022 | 5 | 2022 |
| The effect of excited species on the collisional energy of argon inductively coupled plasmas: A global model study J Karnopp, B Magaldi, J Sagás, R Pessoa Plasma 5 (1), 30-43, 2022 | 5 | 2022 |
| Including substrate temperature in Berg model for reactive sputtering J Karnopp, JC Sagás Thin Solid Films 696, 137761, 2020 | 5 | 2020 |
| Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth J Chaves, W Chiappim, J Karnopp, B Neto, D Leite, A da Silva Sobrinho, ... Nanomaterials 13 (24), 3110, 2023 | 3 | 2023 |
| Shifts in average energy of deposited atoms by magnetron sputtering through modifications in anode geometry: a simulation study J Karnopp, JC Sagás | 2 | 2018 |
| Interações discursivas em aulas de Física Moderna e Contemporânea D Mafra, J Karnopp, A Belluco Anais do XI Encontro Nacional de Pesquisas no ensino de Ciências–SC …, 2017 | 1 | 2017 |
| Exploring TMA and H2O Flow Rate Effects on Al2O3 Thin Film Deposition by Thermal ALD: Insights from Zero-Dimensional Modeling J Karnopp, NA Neto, T Vieira, M Fraga, AS Sobrinho, J Sagás, R Pessoa Coatings 14 (5), 578, 2024 | | 2024 |
| Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching. Nanomaterials 2022, 12, 3497 W Chiappim, BB Neto, M Shiotani, J Karnopp, L Gonçalves, JP Chaves, ... s Note: MDPI stays neu-tral with regard to jurisdictional claims in …, 2022 | | 2022 |
| MODELLING THE MAGNETRON SPUTTERING DISCHARGE USING GLOBAL MODEL J Karnopp, JC Sagás | | |
| EFFECTS OF ANODE GEOMETRY IN ATOM TRANSPORT ON MAGNETRON SPUTTERING DEPOSITION SYSTEM. J Karnopp, JC Sagás | | |
| ANÁLISE TEÓRICA E EXPERIMENTAL DO EFEITO DA TEMPERATURA NA DEPOSIÇÃO REATIVA DE FILMES POR PULVERIZAÇÃO CATÓDICA J Karnopp, JC Sagás | | |
| SIMULAÇÃO DA DEPOSIÇÃO DE FILMES FINOS ATRAVÉS DO PROGRAMA SIMTRA. JC Sagás, J Karnopp | | |
| Comportamento dos pontos críticos da curva de histerese de um sistema magnetron sputtering em função da temperatura do substrato J Karnopp, JC Sagás Langmuir 1, 0, 0 | | |
Julio César SagásUniversidade do Estado de Santa Catarina在 udesc.br 的电子邮件经过验证
Julio César SagásUniversidade do Estado de Santa Catarina在 udesc.br 的电子邮件经过验证
Rodrigo Sávio PessoaInstituto Tecnológico de Aeronáutica在 ita.br 的电子邮件经过验证