关注
P. Jeffrey Ungar
P. Jeffrey Ungar
D2S, Inc.
在 alumni.stanford.edu 的电子邮件经过验证
标题
引用次数
引用次数
年份
Optical molasses and multilevel atoms: theory
PJ Ungar, DS Weiss, E Riis, S Chu
JOSA B 6 (11), 2058-2071, 1989
7791989
Optical molasses and multilevel atoms: experiment
DS Weiss, E Riis, Y Shevy, PJ Ungar, S Chu
JOSA B 6 (11), 2072-2083, 1989
4121989
Ab initio molecular dynamics simulations
ME Tuckerman, PJ Ungar, T Von Rosenvinge, ML Klein
The Journal of Physical Chemistry 100 (31), 12878-12887, 1996
2551996
Interactive multi-pass programmable shading
MS Peercy, M Olano, J Airey, PJ Ungar
Proceedings of the 27th annual conference on Computer graphics and …, 2000
2332000
Controlling battery charging based on current, voltage and temperature
PJ Ungar, TC Greening, WC Athas, JD Field, RM Mank
US Patent 8,624,560, 2014
1072014
Bimodal speed distributions in laser-cooled atoms
Y Shevy, DS Weiss, PJ Ungar, S Chu
Physical review letters 62 (10), 1118, 1989
841989
Adaptive surface concentration battery charging
TC Greening, PJ Ungar, WC Athas
US Patent 9,331,513, 2016
692016
Parallel battery architecture with shared bidirectional converter
TC Greening, WC Athas, PJ Ungar
US Patent 8,575,896, 2013
692013
Diffusion-limited adaptive battery charging
TC Greening, PJ Ungar, WC Athas
US Patent 8,754,611, 2014
682014
Method and system for charging a series battery
SC Michalske, TC Greening, PJ Ungar, WC Athas
US Patent 8,134,336, 2012
462012
Method and system for minimizing an amount of data needed to test data against subarea boundaries in spatially composited digital video
DR Blythe, M Schafer, PJ Ungar, D Yu
US Patent 7,358,974, 2008
452008
Free energies, structures, and diffusion of point defects in Si using an empirical potential
PJ Ungar, T Halicioglu, WA Tiller
Physical Review B 50 (11), 7344, 1994
441994
How curvilinear mask patterning will enhance the EUV process window: a study using rigorous wafer+ mask dual simulation
R Pearman, J Ungar, N Shirali, A Shendre, M Niewczas, L Pang, ...
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation …, 2019
352019
Study of mask and wafer co-design that utilizes a new extreme SIMD approach to computing in memory manufacturing: full-chip curvilinear ILT in a day
L Pang, EV Russell, B Baggenstoss, M Lee, J Digaum, MC Yang, ...
Photomask Technology 2019 11148, 136-151, 2019
342019
Estimating state of charge (SoC) and uncertainty from relaxing voltage measurements in a battery
TC Greening, JG Koller, NE Mattisson, PJ Ungar
US Patent 9,128,162, 2015
342015
Solution-dependent regularization method for quantizing continuous-tone lithography masks
PJ Ungar, IH Torunoglu
US Patent 7,716,627, 2010
322010
Adaptive effective C-rate charging of batteries
TC Greening, JG Koller, PJ Ungar
US Patent 9,559,543, 2017
242017
A GPU-based full-chip inverse lithography solution for random patterns
I Torunoglu, A Karakas, E Elsen, C Andrus, B Bremen, B Dimitrov, J Ungar
Design for Manufacturability through Design-Process Integration IV 7641, 340-347, 2010
222010
Adopting curvilinear shapes for production ILT: challenges and opportunities
R Pearman, J Ungar, N Shirali, A Shendre, M Niewczas, L Pang, ...
Photomask Technology 2019 11148, 122-135, 2019
202019
Diffusion-limited adaptive battery charging
TC Greening, PJ Ungar, WC Athas
US Patent 9,071,071, 2015
182015
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