Optical molasses and multilevel atoms: theory PJ Ungar, DS Weiss, E Riis, S Chu JOSA B 6 (11), 2058-2071, 1989 | 779 | 1989 |
Optical molasses and multilevel atoms: experiment DS Weiss, E Riis, Y Shevy, PJ Ungar, S Chu JOSA B 6 (11), 2072-2083, 1989 | 412 | 1989 |
Ab initio molecular dynamics simulations ME Tuckerman, PJ Ungar, T Von Rosenvinge, ML Klein The Journal of Physical Chemistry 100 (31), 12878-12887, 1996 | 255 | 1996 |
Interactive multi-pass programmable shading MS Peercy, M Olano, J Airey, PJ Ungar Proceedings of the 27th annual conference on Computer graphics and …, 2000 | 233 | 2000 |
Controlling battery charging based on current, voltage and temperature PJ Ungar, TC Greening, WC Athas, JD Field, RM Mank US Patent 8,624,560, 2014 | 107 | 2014 |
Bimodal speed distributions in laser-cooled atoms Y Shevy, DS Weiss, PJ Ungar, S Chu Physical review letters 62 (10), 1118, 1989 | 84 | 1989 |
Adaptive surface concentration battery charging TC Greening, PJ Ungar, WC Athas US Patent 9,331,513, 2016 | 69 | 2016 |
Parallel battery architecture with shared bidirectional converter TC Greening, WC Athas, PJ Ungar US Patent 8,575,896, 2013 | 69 | 2013 |
Diffusion-limited adaptive battery charging TC Greening, PJ Ungar, WC Athas US Patent 8,754,611, 2014 | 68 | 2014 |
Method and system for charging a series battery SC Michalske, TC Greening, PJ Ungar, WC Athas US Patent 8,134,336, 2012 | 46 | 2012 |
Method and system for minimizing an amount of data needed to test data against subarea boundaries in spatially composited digital video DR Blythe, M Schafer, PJ Ungar, D Yu US Patent 7,358,974, 2008 | 45 | 2008 |
Free energies, structures, and diffusion of point defects in Si using an empirical potential PJ Ungar, T Halicioglu, WA Tiller Physical Review B 50 (11), 7344, 1994 | 44 | 1994 |
How curvilinear mask patterning will enhance the EUV process window: a study using rigorous wafer+ mask dual simulation R Pearman, J Ungar, N Shirali, A Shendre, M Niewczas, L Pang, ... Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation …, 2019 | 35 | 2019 |
Study of mask and wafer co-design that utilizes a new extreme SIMD approach to computing in memory manufacturing: full-chip curvilinear ILT in a day L Pang, EV Russell, B Baggenstoss, M Lee, J Digaum, MC Yang, ... Photomask Technology 2019 11148, 136-151, 2019 | 34 | 2019 |
Estimating state of charge (SoC) and uncertainty from relaxing voltage measurements in a battery TC Greening, JG Koller, NE Mattisson, PJ Ungar US Patent 9,128,162, 2015 | 34 | 2015 |
Solution-dependent regularization method for quantizing continuous-tone lithography masks PJ Ungar, IH Torunoglu US Patent 7,716,627, 2010 | 32 | 2010 |
Adaptive effective C-rate charging of batteries TC Greening, JG Koller, PJ Ungar US Patent 9,559,543, 2017 | 24 | 2017 |
A GPU-based full-chip inverse lithography solution for random patterns I Torunoglu, A Karakas, E Elsen, C Andrus, B Bremen, B Dimitrov, J Ungar Design for Manufacturability through Design-Process Integration IV 7641, 340-347, 2010 | 22 | 2010 |
Adopting curvilinear shapes for production ILT: challenges and opportunities R Pearman, J Ungar, N Shirali, A Shendre, M Niewczas, L Pang, ... Photomask Technology 2019 11148, 122-135, 2019 | 20 | 2019 |
Diffusion-limited adaptive battery charging TC Greening, PJ Ungar, WC Athas US Patent 9,071,071, 2015 | 18 | 2015 |