| Degradation of Congo red pollutants using microwave derived SrFe12O19: An efficient magnetic photocatalyst under visible light O Mohanta, YN Singhbabu, SK Giri, D Dadhich, NN Das, RK Sahu Journal of Alloys and Compounds 564, 78–83, 2013 | 80 | 2013 |
| Effect of reverse pulse time on electrodeposited Ni-W coatings DD Shreeram, S Li, V Bedekar, H Cong, GL Doll Surface and Coatings Technology 325, 386–396, 2017 | 35 | 2017 |
| Properties and Tribological Performance of Vanadium Carbide Coatings on AISI 52100 Steel Deposited by Thermoreactive Diffusion BL Strahin, DD Shreeram, GL Doll JOM 69 (7), 1160–1164, 2017 | 31 | 2017 |
| Urine-powered microbial fuel cell using a hyperpiliated pilT mutant of Pseudomonas aeruginosa DD Shreeram, DJ Hassett, DW Schaefer Journal of Industrial Microbiology and Biotechnology 43 (1), 103-107, 2016 | 28 | 2016 |
| Capsule-embedded reduced graphene oxide: synthesis, mechanism and electrical properties YN Singhbabu, KK Sahu, D Dadhich, AK Pramanick, T Mishra, RK Sahu Journal of Materials Chemistry C 1 (5), 958-966, 2013 | 28 | 2013 |
| Effect of impaired twitching motility and biofilm dispersion on performance of Pseudomonas aeruginosa-powered microbial fuel cells DD Shreeram, W Panmanee, CT McDaniel, S Daniel, DW Schaefer, ... Journal of Industrial Microbiology and Biotechnology 45 (2), 103-109, 2018 | 21 | 2018 |
| Corrosion-and wear-resistant pulse reverse current (PRC)-based electrodeposited Ni-W coating DD Shreeram, V Bedekar, S Li, H Cong, GL Doll Jom 70, 2603-2610, 2018 | 10 | 2018 |
| Development of Wear and Corrosion Resistant Nickel Based Coatings Through Pulse Reverse Current (PRC) Electrodeposition Process DD Shreeram Ph. D. Thesis, 2017 | 2 | 2017 |
| Semiconductor structure formation DD Shreeram, S Sapra, MR Laskar, DF Fan, JA Imonigie US Patent 10,777,561, 2020 | 1 | 2020 |
| Effect of Reverse Pulse Current Duration on the Corrosion and Wear Performance of Ni-W Nanolaminate Coatings DD Shreeram, V Bedekar, S Li, R Jagtap, H Cong, GL Doll JOM, 2017 | 1 | 2017 |
| Over-sculpted storage node DD Shreeram, S Sapra, K Li, S Korkmaz US Patent App. 17/944,649, 2024 | | 2024 |
| Integrated assemblies and methods of forming integrated assemblies Y Nakamura, DD Shreeram, YF Lee, SE Sills, JA Imonigie, K Shrimali US Patent 11,848,360, 2023 | | 2023 |
| Digit line and cell contact isolation AP Chan, S Sapra, V Yadav, YT Lin, DD Shreeram US Patent App. 17/731,895, 2023 | | 2023 |
| Integrated memory with redistribution of capacitor connections, and methods of forming integrated memory Y Guangjun, V Nair, DD Shreeram, A Panday, K Li, Z Xie, S Borsari, ... US Patent 11,563,008, 2023 | | 2023 |
| Capacitors with electrodes having a portion of material removed, and related semiconductor devices, systems, and methods DD Shreeram, K Li, MN Rocklein, WC Huang, PC Hsu, S Korkmaz, ... US Patent App. 17/647,902, 2022 | | 2022 |
| Semiconductor structure patterning S Korkmaz, DD Shreeram, S Balakrishnan, D Ray, S Sapra, PA Paduano US Patent 11,011,521, 2021 | | 2021 |
| Column formation using sacrificial material DD Shreeram, DTN Tran, S Sapra US Patent 11,011,523, 2021 | | 2021 |
| Formation of a capacitor using a hard mask DTN Tran, DD Shreeram, S Sapra US Patent 10,978,553, 2021 | | 2021 |
| Formation of a capacitor using a sacrificial layer DD Shreeram, S Korkmaz, J Li, S Sapra, D Ray US Patent 10,964,475, 2021 | | 2021 |
| Reduction of roughness on a sidewall of an opening CJ Gambee, DD Shreeram, IV Vasilyeva US Patent 10,923,478, 2021 | | 2021 |
Gary DollThe University of Akron在 uakron.edu 的电子邮件经过验证
