| Importance of interface roughness induced intersubband scattering in mid-infrared quantum cascade lasers YT Chiu, Y Dikmelik, PQ Liu, NL Aung, JB Khurgin, CF Gmachl Applied Physics Letters 101 (17), 2012 | 73 | 2012 |
| High power spiral cavity quantum cascade superluminescent emitter MC Zheng, NL Aung, A Basak, PQ Liu, X Wang, JY Fan, M Troccoli, ... Optics Express 23 (3), 2713-2719, 2015 | 30 | 2015 |
| Threshold current reduction and directional emission of deformed microdisk lasers via spatially selective electrical pumping NL Aung, L Ge, O Malik, HE Türeci, CF Gmachl Applied Physics Letters 107 (15), 2015 | 21 | 2015 |
| High peak power (≥ 10 mW) quantum cascade superluminescent emitter NL Aung, Z Yu, Y Yu, PQ Liu, X Wang, JY Fan, M Troccoli, CF Gmachl Applied Physics Letters 105 (22), 2014 | 15 | 2014 |
| Analysis of wafer heating in 14nm DUV layers L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 11 | 2016 |
| Overlay control for 7nm technology node and beyond N Aung, WJ Chung, P Samudrala, H Gao, W Gao, D Brown, G He, B Park, ... Optical Microlithography XXXI 10587, 62-73, 2018 | 10 | 2018 |
| Suppression of pointing instability in quantum cascade lasers by transverse mode control PM Bouzi, PQ Liu, N Aung, X Wang, JY Fan, M Troccoli, CF Gmachl Applied Physics Letters 102 (12), 2013 | 7 | 2013 |
| Advanced overlay: sampling and modeling for optimized run-to-run control L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 5 | 2016 |
| Comparison study of diffraction based overlay and image based overlay measurements on programmed overlay errors H Gao, WJ Chung, N Aung, L Subramany, P Samudrala, JM Gomez Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 3 | 2016 |
| Overlay optimization for 1x node technology and beyond via rule based sparse sampling NL Aung, WJ Chung, L Subramany, S Hussain, P Samudrala, H Gao, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 3 | 2016 |
| Novel methodology to optimize wafer alignment to enhance 14nm on product overlay P Samudrala, WJ Chung, L Subramany, H Gao, N Aung, SC Oh, S Lee, ... Optical Microlithography XXX 10147, 530-535, 2017 | 2 | 2017 |
| Effect of surface defects on InGaAs/InAlAs Quantum Cascade mesa current–voltage characteristics NL Aung, X Huang, WO Charles, N Yao, CF Gmachl Journal of crystal growth 353 (1), 35-38, 2012 | 2 | 2012 |
| Intra-pulse modal instability and beam steering in quantum cascade laser Y Yao, PM Bouzi, NL Aung, PQ Liu, Y Huang, C Gmachl, X Wang 2012 Lester Eastman Conference on High Performance Devices (LEC), 1-4, 2012 | 2 | 2012 |
| Alignment solutions on FBEOL layers using ASML scanners: AEPM: Advanced equipment processes and materials P Samudrala, G Hart, YJ Chen, L Subramany, H Gao, N Aung, WJ Chung, ... 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2018 | 1 | 2018 |
| Alignment solutions on FBEOL layers using ASML scanners P Samudrala, G Hart, YJ Chen, L Subramany, H Gao, N Aung, WJ Chung, ... Optical Microlithography XXX 10147, 523-529, 2017 | 1 | 2017 |
| Hybrid Mid-IR OCT system for imaging and spectroscopy using New high power low-coherence quantum cascade superluminescent emitters D Varnell, MC Zheng, N Aung, A Musse, S Lee, C Gmachl 2015 Conference on Lasers and Electro-Optics (CLEO), 1-2, 2015 | 1 | 2015 |
| Semiconductor Laser Cavity Engineering for Coherent and Low-coherence Light Emission NL Aung Princeton University, 2015 | 1 | 2015 |
| Transverse mode control in quantum cascade lasers via lossy lateral constrictions PM Bouzi, PQ Liu, N Aung, X Wang, JY Fan, M Troccoli, CF Gmachl Novel In-Plane Semiconductor Lasers XII 8640, 257-262, 2013 | 1 | 2013 |
| High peak power quantum cascade superluminescent emitter C Gmachl, NL Aung, MC Zheng US Patent App. 14/974,870, 2016 | | 2016 |
| Scanner baseliner monitoring and control in high volume manufacturing P Samudrala, WJ Chung, N Aung, L Subramany, H Gao, JM Gomez Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | | 2016 |
