| Highly etch selective amorphous carbon film S Bobek, PK KULSHRESHTHA, R Prasad, KD Lee, H Whitesell, H Oshio, ... US Patent 10,727,059, 2020 | 224 | 2020 |
| Direct observation of mineral–organic composite formation reveals occlusion mechanism K Rae Cho, YY Kim, P Yang, W Cai, H Pan, AN Kulak, JL Lau, ... Nature communications 7 (1), 10187, 2016 | 120 | 2016 |
| Nano-indentation: A tool to investigate crack propagation related phase transitions in PV silicon PK Kulshreshtha, KM Youssef, G Rozgonyi Solar energy materials and solar cells 96, 166-172, 2012 | 33 | 2012 |
| Method and apparatus for clamping and declamping substrates using electrostatic chucks ZJ Ye, H Hanawa, JC Rocha-Alvarez, P Manna, MW Tsiang, KO Allen, ... US Patent App. 15/370,682, 2017 | 32 | 2017 |
| Ultra-high modulus and etch selectivity boron-carbon hardmask films PK Kulshreshtha, D Ziqing, KT Narasimha, KD Lee, BH Kim US Patent 10,418,243, 2019 | 28 | 2019 |
| Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system ZJ Ye, IIJD Pinson, H Hanawa, J Zhou, X Lin, RG Duan, KD Lee, BH Kim, ... US Patent 10,403,535, 2019 | 24 | 2019 |
| Cleaning process for removing boron-carbon residuals in processing chamber at high temperature F Bi, PK Kulshreshtha, KD Lee, P Connors US Patent 10,679,830, 2020 | 15 | 2020 |
| Effect of nickel contamination on high carrier lifetime n-type crystalline silicon Y Yoon, B Paudyal, J Kim, YW Ok, P Kulshreshtha, S Johnston, ... Journal of Applied Physics 111 (3), 2012 | 14 | 2012 |
| Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography PK Kulshreshtha, K Maruyama, S Kiani, J Blackwell, DL Olynick, ... Nanotechnology 25 (31), 315301, 2014 | 12 | 2014 |
| Oxygen precipitation related stress-modified crack propagation in high growth rate Czochralski silicon wafers PK Kulshreshtha, YH Yoon, KM Youssef, EA Good, G Rozgonyi Journal of the Electrochemical Society 159 (2), H125, 2011 | 12 | 2011 |
| Gas flow profile modulated control of overlay in plasma CVD films PK Kulshreshtha, S Rathi, S Basu, KD Lee, MJ Seamons, BH Kim, ... US Patent 9,390,910, 2016 | 11 | 2016 |
| Sub-20nm lithography negative tone chemically amplified resists using cross-linker additives PK Kulshreshtha, K Maruyama, S Kiani, S Dhuey, P Perera, J Blackwell, ... Advances in Resist Materials and Processing Technology XXX 8682, 162-171, 2013 | 11 | 2013 |
| Silicon PV Wafers: Mechanical strength and correlations with defects and stress GA Rozgonyi, KM Youssef, P Kulshreshtha, M Shi, E Good Solid State Phenomena 178, 79-87, 2011 | 11 | 2011 |
| Mechanistic pathways for the molecular step growth of calcium oxalate monohydrate crystal revealed by in situ liquid-phase atomic force microscopy KR Cho, JH Lee, HS Seo, Y Ji, JH Park, SE Lee, HW Kim, KJJ Wu, ... ACS Applied Materials & Interfaces 13 (31), 37873-37882, 2021 | 8 | 2021 |
| The effects of different types of additives on growth of biomineral phases investigated by in situ atomic force microscopy KR Cho, P Kulshreshtha, KJJ Wu, J Seto, SR Qiu, JJ De Yoreo Journal of Crystal Growth 509, 8-16, 2019 | 8 | 2019 |
| Cleaning process for cleaning amorphous carbon deposition residuals using low rf bias frequency applications P Manna, PK Kulshreshtha, KD Lee, MJ Seamons, AB Mallick, BH Kim, ... US Patent App. 14/619,138, 2015 | 7 | 2015 |
| Gas flow profile modulated control of overlay in plasma CVD films PK Kulshreshtha, S Rathi, S Basu, KD Lee, MJ Seamons, BH Kim, ... US Patent 10,373,822, 2019 | 6 | 2019 |
| Selective laser ablation in resists and block copolymers for high resolution lithographic patterning DL Olynick, P Perera, A Schwartzberg, P Kulshreshta, DG De Oteyza, ... Journal of Photopolymer Science and Technology 28 (5), 663-668, 2015 | 5 | 2015 |
| Nanoscale modulus and surface chemistry characterization for collapse free resists PK Kulshreshtha, K Maruyama, S Kiani, D Ziegler, J Blackwell, D Olynick, ... Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 5 | 2013 |
| Highly etch selective amorphous carbon film R Prasad, S Bobek, PK Kulshreshtha, KD Lee, H Whitesell, H Oshio, ... US Patent 11,469,107, 2022 | 3 | 2022 |
Paul AshbyStaff Scientist, Molecular Foundry, Lawrence Berkeley National Laboratory在 lbl.gov 的电子邮件经过验证
