| Comprehensive defect suppression in perovskite nanocrystals for high-efficiency light-emitting diodes YH Kim, S Kim, A Kakekhani, J Park, J Park, YH Lee, H Xu, S Nagane, ... Nature Photonics 15 (2), 148-155, 2021 | 685 | 2021 |
| Grain size control of Bi-substituted garnet films crystallized by multi-step rapid thermal annealing for magneto-optical disks HS Kim, YHLYH Lee, SSLSS Lee Japanese journal of applied physics 32 (12B), L1804, 1993 | 14 | 1993 |
| Effect of nickel silicide gettering on metal-induced crystallized polycrystalline-silicon thin-film transistors HY Kim, KH Seok, HJ Chae, SK Lee, YH Lee, SK Joo Solid-State Electronics 132, 73-79, 2017 | 6 | 2017 |
| Tempered glass substrate effect on the growth of polycrystalline-silicon and its applications for reliable thin-film transistors JH Park, HY Kim, KH Seok, HJ Chae, SK Lee, YH Lee, Z Kiaee, SK Joo RSC Advances 5 (69), 55909-55913, 2015 | 6 | 2015 |
| Progress of p-channel bottom-gate poly-Si thin-film transistor by nickel silicide seed-induced lateral crystallization SK Lee, KH Seok, JH Park, HY Kim, HJ Chae, GS Jang, YH Lee, JS Han, ... Applied Physics A 122, 1-6, 2016 | 5 | 2016 |
| Annealing effect of sputter-grown Pt/Ni80Fe20/Pt sandwich trilayer films on Gilbert damping Y Kim, B Kim, B Bhoi, YH Lee, YW Kim, SK Kim Journal of Applied Physics 128 (22), 2020 | 3 | 2020 |
| Bottom-gate poly-Si thin-film transistors by nickel silicide seed-induced lateral crystallization with self-aligned lightly doped layer SK Lee, KH Seok, HJ Chae, YH Lee, JS Han, HA Jo, SK Joo Solid-State Electronics 129, 6-9, 2017 | 3 | 2017 |
| Effect of Ultrathin Silicon Oxide Film for Enhanced Performance and Reliability of Metal-Induced Laterally Crystallized Thin-Film Transistors Using Silicon Nitride as a Gate … HJ Chae, HY Kim, SK Lee, KH Seok, YH Lee, Z Kiaee, SK Joo ECS Journal of Solid State Science and Technology 5 (12), Q279, 2016 | 2 | 2016 |
| Advanced Four-Mask Process Bottom-Gate Poly-Si TFT via Self-Aligned NiSi2 Seed-Induced Lateral Crystallization SK Lee, KH Seok, HY Kim, Z Kiaee, HJ Chae, YH Lee, SK Joo IEEE Electron Device Letters 37 (10), 1292-1294, 2016 | 2 | 2016 |
| Compressive Stressed P-Channel Polycrystalline-Silicon Thin-Film Transistors for High Field-Effect Mobility JH Park, KH Seok, HY Kim, SK Lee, HJ Chae, YH Lee, JH Lee, Z Kiaee, ... IEEE Electron Device Letters 36 (8), 793-795, 2015 | 2 | 2015 |
| Novel fabrication of lightly doped-drain for suppressing the leakage current in polycrystalline silicon thin-film transistor HY Kim, KH Seok, Z Kiaee, HJ Chae, SK Lee, YH Lee, S Ki Joo Journal of Nanoscience and Nanotechnology 17 (5), 3465-3468, 2017 | 1 | 2017 |
| Direct/Indirect Junction Between Channel Inversion Layer and Doped Source/Drain Region on Metal-Induced Lateral Crystallization Polycrystalline Silicon Bottom Gate TFTs KH Seok, SK Lee, HY Kim, HJ Chae, YH Lee, SK Joo IEEE Transactions on Electron Devices 64 (2), 432-437, 2016 | 1 | 2016 |
| Thermal Stress Effect on Nickel Silicide Seed-Induced Laterally Crystallized Polycrystalline-Silicon Thin-Film Transistors HY Kim, JH Park, KH Seok, Z Kiaee, HJ Chae, SK Lee, YH Lee, JH Lee, ... Journal of Nanoscience and Nanotechnology 16 (9), 9756-9760, 2016 | 1 | 2016 |
| Luminescence properties related anti-phase domain of alpha-Ga2O3 YH Lee, B Gil, D Yang, MH Sheen, E Yoon, Y Park, HW Jang, S Yoon, ... APL Materials 11 (5), 2023 | | 2023 |
| Origin of extra diffraction spots for high crystalline alpha-Ga2O3 YH Lee, D Yang, B Gil, MH Sheen, E Yoon, Y Park, HW Jang, S Yoon, ... AIP Advances 13 (2), 2023 | | 2023 |
| Erratum to: Progress of p-channel bottom-gate poly-Si thin-film transistor by nickel silicide seed-induced lateral crystallization SK Lee, KH Seok, JH Park, HY Kim, HJ Chae, GS Jang, YH Lee, JS Han, ... Applied Physics A 122, 1-2, 2016 | | 2016 |
| Electrical Properties of Bottom Gate Poly-Si TFTs by NiSi2 Seed-Induced Lateral Crystallization and Its Applications SK Lee, KH Seok, Z Kiaee, HY Kim, HJ Chae, YH Lee, GS Jang, SK Joo MRS Advances 1 (50), 3429-3433, 2016 | | 2016 |
| Edge Cut Process for Reducing Ni Content at Channel Edge Region in Metal Induced Lateral Crystallization Poly-Si TFTs KH Seok, HY Kim, JH Park, SK Lee, YH Lee, SK Joo JSTS: Journal of Semiconductor Technology and Science 16 (2), 166-171, 2016 | | 2016 |
| Retrograde-Mask Processed Polysilicon TFT for High Performance, Planar Structure, and Stable Operation JH Park, HY Kim, KH Seok, Z Kiaee, SK Lee, HJ Chae, YH Lee, JH Lee, ... IEEE Electron Device Letters 36 (8), 790-792, 2015 | | 2015 |
