| Pulsed high-density plasmas for advanced dry etching processes S Banna, A Agarwal, G Cunge, M Darnon, E Pargon, O Joubert Journal of Vacuum Science & Technology A 30 (4), 2012 | 203 | 2012 |
| Ultralow-loss tightly confining Si3N4 waveguides and high-Q microresonators H El Dirani, L Youssef, C Petit-Etienne, S Kerdiles, P Grosse, C Monat, ... Optics express 27 (21), 30726-30740, 2019 | 163 | 2019 |
| Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists E Pargon, K Menguelti, M Martin, A Bazin, O Chaix-Pluchery, C Sourd, ... Journal of applied physics 105 (9), 2009 | 94 | 2009 |
| Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing C Petit-Etienne, M Darnon, L Vallier, E Pargon, G Cunge, F Boulard, ... Journal of Vacuum Science & Technology B 28 (5), 926-934, 2010 | 78 | 2010 |
| Impact of chemistry on profile control of resist masked silicon gates etched in high density halogen-based plasmas X Detter, R Palla, I Thomas-Boutherin, E Pargon, G Cunge, O Joubert, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 71 | 2003 |
| Etching mechanisms of HfO2, SiO2, and poly-Si substrates in BCl3 plasmas E Sungauer, E Pargon, X Mellhaoui, R Ramos, G Cunge, L Vallier, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 67 | 2007 |
| An atomic force microscopy-based method for line edge roughness measurement M Fouchier, E Pargon, B Bardet Journal of applied physics 113 (10), 2013 | 57 | 2013 |
| Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light E Pargon, M Martin, K Menguelti, L Azarnouche, J Foucher, O Joubert Applied Physics Letters 94 (10), 2009 | 55 | 2009 |
| Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy L Azarnouche, E Pargon, K Menguelti, M Fouchier, D Fuard, P Gouraud, ... Journal of Applied Physics 111 (8), 2012 | 54 | 2012 |
| Monitoring chamber walls coating deposited during plasma processes: Application to silicon gate etch processes O Joubert, G Cunge, B Pelissier, L Vallier, M Kogelschatz, E Pargon Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (3 …, 2004 | 53 | 2004 |
| Linewidth roughness transfer measured by critical dimension atomic force microscopy during plasma patterning of polysilicon gate transistors E Pargon, M Martin, J Thiault, O Joubert, J Foucher, T Lill Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 47 | 2008 |
| HBr plasma treatment versus VUV light treatment to improve 193 nm photoresist pattern linewidth roughness E Pargon, L Azarnouche, M Fouchier, K Menguelti, R Tiron, C Sourd, ... Plasma Processes and Polymers 8 (12), 1184-1195, 2011 | 46 | 2011 |
| Improvement of sidewall roughness of submicron SOI waveguides by hydrogen plasma and annealing C Bellegarde, E Pargon, C Sciancalepore, C Petit-Etienne, V Hugues, ... IEEE Photonics Technology Letters 30 (7), 591-594, 2018 | 45 | 2018 |
| Method of patterning of magnetic tunnel junctions O Joubert, B Schwarz, JGM Pereira, K Menguelti, EM Pargon, M Darnon US Patent 8,546,263, 2013 | 42 | 2013 |
| Chemical topography analyses of silicon gates etched in and high density plasmas L Vallier, J Foucher, X Detter, E Pargon, O Joubert, G Cunge, T Lill Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 41 | 2003 |
| Benefits of plasma treatments on critical dimension control and line width roughness transfer during gate patterning L Azarnouche, E Pargon, K Menguelti, M Fouchier, O Joubert, P Gouraud, ... Journal of Vacuum Science & Technology B 31 (1), 2013 | 40 | 2013 |
| Towards a controlled patterning of 10 nm silicon gates in high density plasmas E Pargon, M Darnon, O Joubert, T Chevolleau, L Vallier, L Mollard, T Lill Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 32 | 2005 |
| A complete Si photonics platform embedding ultra-low loss waveguides for O-and C-band Q Wilmart, S Brision, JM Hartmann, A Myko, K Ribaud, C Petit-Etienne, ... Journal of Lightwave Technology 39 (2), 532-538, 2020 | 31 | 2020 |
| Characterisation of ultraviolet nanoimprint dedicated resists P Voisin, M Zelsmann, R Cluzel, E Pargon, C Gourgon, J Boussey Microelectronic engineering 84 (5-8), 967-972, 2007 | 30 | 2007 |
| Line-edge-roughness transfer during plasma etching: modeling approaches and comparison with experimental results V Constantoudis, G Kokkoris, P Xydi, E Gogolides, E Pargon, M Martin Journal of Micro/Nanolithography, MEMS and MOEMS 8 (4), 043004-043004-8, 2009 | 29 | 2009 |
