| Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing application RM Neubieser, JL Wree, J Jagosz, M Becher, A Ostendorf, A Devi, C Bock, ... Micro and Nano Engineering 15, 100126, 2022 | 10 | 2022 |
| Formation of low- and high-spatial frequency laser-induced periodic surface structures (LIPSSs) in ALD-deposited MoS2 MJMJ Becher, J Jagosz, C Bock, A Ostendorf, EL Gurevich Frontiers in Nanotechnology 5, 1227025, 2023 | 4 | 2023 |
| Nucleation and growth studies of large-area deposited WS2 on flexible substrates T Berning, M Becher, JL Wree, J Jagosz, A Kostka, A Ostendorf, A Devi, ... Materials Research Express 9 (11), 116401, 2022 | 4 | 2022 |
| Development of form-fit connection for NiTi shape memory wire actuators using laser processing M Schuleit, M Becher, F Franke, B Maaß, C Esen Procedia CIRP 94, 546-550, 2020 | 3 | 2020 |
| Ultrashort‐Pulsed‐Laser Annealing of Amorphous Atomic‐Layer‐Deposited MoS2 Films MJMJ Becher, J Jagosz, RM Neubieser, JL Wree, A Devi, M Michel, ... Advanced Engineering Materials 25 (21), 2300677, 2023 | 2 | 2023 |
| Large-area deposition of thin crystalline MoS2 films on 200 mm wafers using plasma-assisted atomic layer deposition J Jagosz, L Willeke, M Becher, A Ostendorf, P Plate, C Bock Mikro-Nano-Integration; 9. GMM-Workshop, 1-4, 2022 | 2 | 2022 |
| Post treatment of plasma enhanced atomic layer deposited MoS2 via ultra short pulse laser to increase the crystallinity MJMJ Becher, L Willeke, C Bock, A Ostendorf Laser+ Photonics for Advanced Manufacturing 13005, 101-108, 2024 | | 2024 |
| Laser-based modification of ALD-grown 2D-transition metal dichalcogenides A Ostendorf, M Becher, J Jagosz, C Bock Nanoscale and Quantum Materials: From Synthesis and Laser Processing to …, 2023 | | 2023 |
| Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films JL Wree, JP Glauber, D Zanders, D Rogalla, M Becher, MBE Griffiths, ... ACS Applied Electronic Materials 4 (8), 3772-3779, 2022 | | 2022 |
| Raman spectroscopy as an effective tool for characterizing large-area 2D TMDs deposited from the gas phase M Becher, JL Wree, T Berning, RM Neubieser, MD Michel, C Bock, A Devi, ... MikroSystemTechnik Congress 2021; Congress, 1-4, 2021 | | 2021 |
| Wafer‐Scale Demonstration of Polycrystalline MoS2 Growth on 200 mm Glass and SiO2/Si Substrates by Plasma‐Enhanced Atomic Layer Deposition J Jagosz, L Willeke, N Gerke, MJMJ Becher, P Plate, A Kostka, D Rogalla, ... Advanced Materials Technologies, 2400492, 0 | | |
| Micro and Nano Engineering RM Neubieser, JL Wree, J Jagosz, M Becher, A Ostendorf, A Devi, C Bock, ... | | |
| Ultrashort pulsed laser annealing of amorphous MoS2 produced by ALD M Becher | | |
