Engineered 3D polymer and hydrogel microenvironments for cell culture applications D Fan, U Staufer, A Accardo Bioengineering 6 (4), 113, 2019 | 83 | 2019 |
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light D Fan, Y Ekinci Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033505-033505, 2016 | 56* | 2016 |
Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths N Mojarad, D Fan, J Gobrecht, Y Ekinci Optics Letters 39 (8), 2286-2289, 2014 | 49 | 2014 |
SnOx high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography E Buitrago, R Fallica, D Fan, TS Kulmala, M Vockenhuber, Y Ekinci Microelectronic Engineering 155, 44-49, 2016 | 42 | 2016 |
Emergent collective organization of bone cells in complex curvature fields SJP Callens, D Fan, IAJ van Hengel, M Minneboo, PJ Díaz-Payno, ... Nature Communications 14 (1), 855, 2023 | 41 | 2023 |
Strain and thermal conductivity in ultrathin suspended silicon nanowires D Fan, H Sigg, R Spolenak, Y Ekinci Physical Review B 96 (11), 115307, 2017 | 41 | 2017 |
Effect of the pn junction engineering on Si microwire‐array solar cells A Dalmau Mallorquí, FM Epple, D Fan, O Demichel, ... physica status solidi (a) 209 (8), 1588-1591, 2012 | 35 | 2012 |
Nickel electroplating for high-resolution nanostructures K Hili, D Fan, VA Guzenko, Y Ekinci Microelectronic Engineering 141, 122-128, 2015 | 34 | 2015 |
3D printing of large areas of highly ordered submicron patterns for modulating cell behavior M Nouri-Goushki, MJ Mirzaali, L Angeloni, D Fan, M Minneboo, ... ACS applied materials & interfaces 12 (1), 200-208, 2019 | 29 | 2019 |
Fabrication of a microfluidic device by using two-photon lithography on a positive photoresist G van der Velden, D Fan, U Staufer Micro and Nano Engineering 7, 100054, 2020 | 25 | 2020 |
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility D Fan, E Buitrago, S Yang, W Karim, Y Wu, R Tai, Y Ekinci Microelectronic Engineering 155, 55-60, 2016 | 23 | 2016 |
Evidence for carbon clusters present near thermal gate oxides affecting the electronic band structure in SiC-MOSFET D Dutta, DS De, D Fan, S Roy, G Alfieri, M Camarda, M Amsler, ... Applied Physics Letters 115 (10), 2019 | 21 | 2019 |
Fabrication of ultrahigh resolution metal nanowires and nanodots through EUV interference lithography J Huang, D Fan, Y Ekinci, C Padeste Microelectronic Engineering 141, 32-36, 2015 | 19 | 2015 |
All-dielectric metasurface-based roll-angle sensor X Chen, Z Tao, C Chen, C Wang, L Wang, H Jiang, D Fan, Y Ekinci, S Liu Sensors and Actuators A: Physical 279, 509-517, 2018 | 17 | 2018 |
Nanolithography using Bessel beams of extreme ultraviolet wavelength D Fan, L Wang, Y Ekinci Scientific reports 6 (1), 31301, 2016 | 17 | 2016 |
EUV resists towards 11nm half-pitch Y Ekinci, M Vockenhuber, N Mojarad, D Fan Extreme Ultraviolet (EUV) Lithography V 9048, 904804, 2014 | 17 | 2014 |
SOLEIL: single-objective lens inclined light sheet localization microscopy ST Hung, J Cnossen, D Fan, M Siemons, D Jurriens, K Grußmayer, ... Biomedical Optics Express 13 (6), 3275-3294, 2022 | 11 | 2022 |
Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing L Wang, D Fan, VA Guzenko, Y Ekinci Journal of Vacuum Science & Technology B 31 (6), 2013 | 10 | 2013 |
Theoretical minimum uncertainty of single-molecule localizations using a single-photon avalanche diode array Q Houwink, D Kalisvaart, ST Hung, J Cnossen, D Fan, P Mos, A Can Ülkü, ... Optics Express 29 (24), 39920-39929, 2021 | 8 | 2021 |
From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer … E Buitrago, R Fallica, D Fan, W Karim, M Vockenhuber, JA van Bokhoven, ... UV and Higher Energy Photonics: From Materials to Applications 9926, 59-70, 2016 | 6 | 2016 |