The paradigm shift in understanding the bias temperature instability: From reaction–diffusion to switching oxide traps T Grasser, B Kaczer, W Goes, H Reisinger, T Aichinger, P Hehenberger, ... IEEE Transactions on Electron Devices 58 (11), 3652-3666, 2011 | 529 | 2011 |
A two-stage model for negative bias temperature instability T Grasser, B Kaczer, W Goes, T Aichinger, P Hehenberger, M Nelhiebel 2009 IEEE international reliability physics symposium, 33-44, 2009 | 293 | 2009 |
Analytic modeling of the bias temperature instability using capture/emission time maps T Grasser, PJ Wagner, H Reisinger, T Aichinger, G Pobegen, M Nelhiebel, ... 2011 International Electron Devices Meeting, 27.4. 1-27.4. 4, 2011 | 220 | 2011 |
Switching oxide traps as the missing link between negative bias temperature instability and random telegraph noise T Grasser, H Reisinger, W Goes, T Aichinger, P Hehenberger, PJ Wagner, ... 2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009 | 149 | 2009 |
Theory of orientation-sensitive near-edge fine-structure core-level spectroscopy M Nelhiebel, PH Louf, P Schattschneider, P Blaha, K Schwarz, B Jouffrey Physical Review B 59 (20), 12807, 1999 | 148 | 1999 |
Recent advances in understanding the bias temperature instability T Grasser, B Kaczer, W Goes, H Reisinger, T Aichinger, P Hehenberger, ... 2010 international electron devices meeting, 4.4. 1-4.4. 4, 2010 | 136 | 2010 |
The ‘permanent’component of NBTI: Composition and annealing T Grasser, T Aichinger, G Pobegen, H Reisinger, PJ Wagner, J Franco, ... 2011 International Reliability Physics Symposium, 6A. 2.1-6A. 2.9, 2011 | 107 | 2011 |
Density matrix of inelastically scattered fast electrons P Schattschneider, M Nelhiebel, B Jouffrey Physical Review B 59 (16), 10959, 1999 | 95 | 1999 |
The orientation-dependent simulation of ELNES C Hébert-Souche, PH Louf, P Blaha, M Nelhiebel, J Luitz, ... Ultramicroscopy 83 (1-2), 9-16, 2000 | 90 | 2000 |
Orientation sensitive EELS-analysis of boron nitride nanometric hollow spheres C Souche, B Jouffrey, G Hug, M Nelhiebel Micron 29 (6), 419-424, 1998 | 79 | 1998 |
Understanding negative bias temperature instability in the context of hole trapping T Grasser, B Kaczer, W Gös, T Aichinger, P Hehenberger, M Nelhiebel Microelectronic Engineering 86 (7-9), 1876-1882, 2009 | 73 | 2009 |
The physical significance of the mixed dynamic form factor P Schattschneider, M Nelhiebel, H Souchay, B Jouffrey Micron 31 (4), 333-345, 2000 | 73 | 2000 |
Unambiguous identification of the NBTI recovery mechanism using ultra-fast temperature changes T Aichinger, M Nelhiebel, T Grasser 2009 IEEE International Reliability Physics Symposium, 2-7, 2009 | 67 | 2009 |
On the temperature dependence of NBTI recovery T Aichinger, M Nelhiebel, T Grasser Microelectronics Reliability 48 (8-9), 1178-1184, 2008 | 59 | 2008 |
Observation of normally distributed energies for interface trap recovery after hot-carrier degradation G Pobegen, S Tyaginov, M Nelhiebel, T Grasser IEEE electron device letters 34 (8), 939-941, 2013 | 56 | 2013 |
A reliable technology concept for active power cycling to extreme temperatures M Nelhiebel, R Illing, C Schreiber, S Wöhlert, S Lanzerstorfer, M Ladurner, ... Microelectronics Reliability 51 (9-11), 1927-1932, 2011 | 53 | 2011 |
High temperature storage reliability investigation of the Al–Cu wire bond interface R Pelzer, M Nelhiebel, R Zink, S Wöhlert, A Lassnig, G Khatibi Microelectronics Reliability 52 (9-10), 1966-1970, 2012 | 47 | 2012 |
In Situ Poly Heater—A Reliable Tool for Performing Fast and Defined Temperature Switches on Chip T Aichinger, M Nelhiebel, S Einspieler, T Grasser IEEE Transactions on Device and Materials Reliability 10 (1), 3-8, 2009 | 47 | 2009 |
Understanding temperature acceleration for NBTI G Pobegen, T Aichinger, M Nelhiebel, T Grasser 2011 International Electron Devices Meeting, 27.3. 1-27.3. 4, 2011 | 46 | 2011 |
Do NBTI-induced interface states show fast recovery? A study using a corrected on-the-fly charge-pumping measurement technique P Hehenberger, T Aichinger, T Grasser, W Gos, O Triebl, B Kaczer, ... 2009 IEEE International Reliability Physics Symposium, 1033-1038, 2009 | 43 | 2009 |