| Observation of self-organized filaments in a dielectric barrier discharge of Ar gas T Shirafuji, T Kitagawa, T Wakai, K Tachibana Applied physics letters 83 (12), 2309-2311, 2003 | 133 | 2003 |
| Effects of self-erasing discharges on the uniformity of the dielectric barrier discharge T Somekawa, T Shirafuji, O Sakai, K Tachibana, K Matsunaga Journal of Physics D: Applied Physics 38 (12), 1910, 2005 | 63 | 2005 |
| Measurement of SiH2 densities in an RF-discharge silane plasma used in the chemical vapor deposition of hydrogenated amorphous silicon film K Tachibana, TS Matsui Japanese journal of applied physics 31 (8R), 2588, 1992 | 61 | 1992 |
| Functionalization of multiwalled carbon nanotubes by solution plasma processing in ammonia aqueous solution and preparation of composite material with polyamide 6 T Shirafuji, Y Noguchi, T Yamamoto, J Hieda, N Saito, O Takai, ... Japanese Journal of Applied Physics 52 (12R), 125101, 2013 | 58 | 2013 |
| Plasma copolymerization of tetrafluoroethylene/hexamethyldisiloxane and in situ Fourier transform infrared spectroscopy of its gas phase TST Shirafuji, YMY Miyazaki, YNY Nakagami, YHY Hayashi, SNS Nishino Japanese journal of applied physics 38 (7S), 4520, 1999 | 51 | 1999 |
| Fabrication of vertically aligned diamond whiskers from highly boron-doped diamond by oxygen plasma etching C Terashima, K Arihara, S Okazaki, T Shichi, DA Tryk, T Shirafuji, N Saito, ... ACS Applied Materials & Interfaces 3 (2), 177-182, 2011 | 50 | 2011 |
| Underwater microdischarge in arranged microbubbles produced by electrolysis in electrolyte solution using fabric-type electrode O Sakai, M Kimura, T Shirafuji, K Tachibana Applied Physics Letters 93 (23), 2008 | 47 | 2008 |
| Plasma enhanced chemical vapor deposition of thermally stable and low-dielectric-constant fluorinated amorphous carbon films using low-global-warming-potential gas C5F8 T Shirafuji, A Kamisawa, T Shimasaki, Y Hayashi, S Nishino Thin Solid Films 374 (2), 256-261, 2000 | 35 | 2000 |
| Gold nanoparticle synthesis using three-dimensionally integrated micro-solution plasmas T Shirafuji, J Ueda, A Nakamura, SP Cho, N Saito, O Takai Japanese Journal of Applied Physics 52 (12R), 126202, 2013 | 34 | 2013 |
| Measurement and Calculation of SiH2 Radical Density in SiH4 and Si2H6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films T Shirafuji, K Tachibana, Y Matsui Japanese Journal of Applied Physics 34 (8R), 4239, 1995 | 30 | 1995 |
| Heteroepitaxial growth of 3C–SiC using HMDS by atmospheric CVD Y Chen, K Matsumoto, Y Nishio, T Shirafuji, S Nishino Materials Science and Engineering: B 61, 579-582, 1999 | 29 | 1999 |
| PE-CVD of Fluorocarbon/SiO Composite Thin Films Using C4F8 and HMDSO T Shirafuji, Y Miyazaki, Y Hayashi, S Nishino Plasmas and Polymers 4, 57-75, 1999 | 29 | 1999 |
| Solution plasma surface modification for nanocarbon-composite materials J Hieda, T Shirafuji, Y Noguchi, N Saito, O Takai Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals 73 (12 …, 2009 | 28 | 2009 |
| Submillimeter dielectric barrier discharges at atmospheric pressure: Edge effect SN Abolmasov, T Shirafuji, K Tachibana IEEE transactions on plasma science 33 (2), 941-948, 2005 | 27 | 2005 |
| Mechanisms of pattern formation in dielectric barrier discharges SN Abolmasov, K Tachibana, T Shirafuji IEEE Transactions on Plasma Science 39 (11), 2090-2091, 2011 | 26 | 2011 |
| Numerical simulation of electric double layer in contact with dielectric barrier discharge: Effects of ion transport parameters in liquid T Shirafuji, A Nakamura, F Tochikubo Japanese Journal of Applied Physics 53 (3S2), 03DG04, 2014 | 24 | 2014 |
| etching with perfluorobutadiene in a dual frequency plasma reactor F Fracassi, R d’Agostino, E Fornelli, F Illuzzi, T Shirafuji Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (3 …, 2003 | 22 | 2003 |
| Generation of three-dimensionally integrated micro-solution plasma and its application to decomposition of methylene blue molecules in water T Shirafuji, Y Himeno Japanese Journal of Applied Physics 52 (11S), 11NE03, 2013 | 21 | 2013 |
| Investigations of the surface chemistry of silicon substrates etched in a rf-biased inductively coupled fluorocarbon plasma using Fourier-transform infrared ellipsometry GMW Kroesen, HJ Lee, H Moriguchi, H Motomura, T Shirafuji, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (1 …, 1998 | 21 | 1998 |
| Contribution of electrons, Ar (3P0, 2), H2O+, and H3O+ to production of OH (A2Σ+) in a micro-dielectric barrier discharge of Ar/H2O T Shirafuji, T Murakami Japanese Journal of Applied Physics 54 (1S), 01AC03, 2014 | 19 | 2014 |
