关注
Ryuichi Sugie
Ryuichi Sugie
Toray research center
在 trc.toray 的电子邮件经过验证
标题
引用次数
引用次数
年份
Determination of stress components in 4H-SiC power devices via Raman spectroscopy
R Sugie, T Uchida
Journal of Applied Physics 122 (19), 2017
542017
Impact of back-grinding-induced damage on Si wafer thinning for three-dimensional integration
Y Mizushima, Y Kim, T Nakamura, R Sugie, H Hashimoto, A Uedono, ...
Japanese Journal of Applied Physics 53 (5S2), 05GE04, 2014
472014
Measurement of temperature-dependent stress in copper-filled silicon vias using polarized Raman spectroscopy
R Sugie, K Kosaka, H Seki, H Hashimoto, M Yoshikawa
Journal of Applied Physics 114 (23), 2013
302013
Stress characterization of si by a scanning near-field optical Raman microscope with spatial resolution and with penetration depth at the nanometer level, using resonant Raman …
M Yoshikawa, M Murakami, K Matsuda, R Sugie, H Ishida, R Shimizu
Japanese journal of applied physics 45 (5L), L486, 2006
222006
Thermoplastic resin composition and sheets and cards made from the same
R Sugie, T Nishimura, M Hiratsuka
US Patent 6,333,113, 2001
202001
Defect characterization of Si-doped GaN films by a scanning near-field optical microscope-induced photoluminescence
M Yoshikawa, R Sugie, M Murakami, T Matsunobe, K Matsuda, H Ishida
Applied physics letters 88 (16), 2006
182006
Characterization of process-induced defects in SiC MOSFETs by cross-sectional cathodoluminescence
R Sugie, T Uchida, K Kosaka, K Matsumura
Japanese Journal of Applied Physics 55 (4S), 04ER03, 2016
152016
Investigation of stress-induced defects in shallow trench isolation by cathodoluminescence and Raman spectroscopies
R Sugie, K Matsuda, T Ajioka, M Yoshikawa, T Mizukoshi, K Shibusawa, ...
Journal of applied physics 100 (6), 2006
152006
Two-dimensional analysis of the nonuniform quantum yields of multiple quantum wells for AlGaN-based deep-ultraviolet LEDs grown on AlN templates with dense macrosteps using …
Y Nagasawa, R Sugie, K Kojima, A Hirano, M Ippommatsu, Y Honda, ...
Journal of Applied Physics 126 (21), 2019
142019
Characterization of damage in SiO2 during helium ion microscope observation by luminescence and TEM-EELS
S Ogawa, T Iijima, S Awata, R Sugie, N Kawasaki, Y Otsuka
Microscopy and Microanalysis 18 (S2), 814-815, 2012
132012
Measurement of the properties of GaN layers using terahertz time‐domain spectroscopic ellipsometry
K Tachi, S Asagami, T Fujii, T Araki, Y Nanishi, T Nagashima, T Iwamoto, ...
physica status solidi (b) 254 (8), 1600767, 2017
112017
Detailed analysis of Ga-rich current pathways created in an n-Al0. 7Ga0. 3N layer grown on an AlN template with dense macrosteps
Y Nagasawa, A Hirano, M Ippommatsu, H Sako, A Hashimoto, R Sugie, ...
Applied Physics Express 13 (12), 124001, 2020
102020
Semi-quantitative analysis of the depth distribution of radiative recombination centers in silicon power devices by cross-sectional cathodoluminescence
R Sugie, K Inoue, M Yoshikawa
Journal of Applied Physics 112 (3), 2012
102012
Cathodoluminescence Microcharacterization of Radiative Recombination Centers in Lifetime-Controlled Insulated Gate Bipolar Transistors
R Sugie, T Mitani, M Yoshikawa, Y Iwata, R Satoh
Japanese Journal of Applied Physics 49 (4S), 04DP15, 2010
102010
Raman scattering of interface modes in ZnTe–CdSe superlattices
R Sugie, H Ohta, H Harima, S Nakashima, H Fujiyasu
Journal of applied physics 80 (10), 5946-5950, 1996
91996
Direct growth of GaN film on ScAlMgO4 substrate by radio-frequency plasma-excited molecular beam epitaxy
T Araki, S Kayamoto, Y Wada, Y Kuroda, D Nakayama, N Goto, M Deura, ...
Applied Physics Express 16 (2), 025504, 2023
82023
Characterization of defect structure in epilayer grown on on-axis sic by synchrotron X-ray topography
K Ishiji, M Kato, R Sugie
Journal of Electronic Materials 51 (4), 1541-1547, 2022
82022
Expansion of stacking faults by electron-beam irradiation in 4H-SiC diode structure
R Sugie, M Yoshikawa, S Harada, Y Namikawa
Materials Science Forum 600, 353-356, 2009
82009
An application of cathodoluminescence to optimize the shallow trench isolation process
T Mizukoshi, K Shibusawa, S Yo, R Sugie, T Ajioka
IEEE transactions on semiconductor manufacturing 18 (4), 546-553, 2005
82005
Low-energy cross-sectional cathodoluminescence analysis of the depth distribution of point defects in Si-ion-implanted β-Ga2O3
R Sugie, T Uchida, A Hashimoto, S Akahori, K Matsumura, Y Tanii
Applied Physics Express 13 (12), 126502, 2020
72020
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