| Plasma etch technologies for the development of ultra-small feature size transistor devices D Borah, MT Shaw, S Rasappa, RA Farrell, C O'Mahony, CM Faulkner, ... Journal of Physics D: Applied Physics 44 (17), 174012, 2011 | 100 | 2011 |
| Sub-10 nm Feature Size PS-b-PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process D Borah, MT Shaw, JD Holmes, MA Morris ACS Applied Materials & Interfaces 5 (6), 2004-2012, 2013 | 89 | 2013 |
| A general method for controlled nanopatterning of oxide dots: a microphase separated block copolymer platform T Ghoshal, MT Shaw, CT Bolger, JD Holmes, MA Morris Journal of Materials Chemistry 22 (24), 12083-12089, 2012 | 81 | 2012 |
| Monitoring PMMA Elimination by Reactive Ion Etching from a Lamellar PS-b-PMMA Thin Film by ex Situ TEM Methods RA Farrell, N Petkov, MT Shaw, V Djara, JD Holmes, MA Morris Macromolecules 43 (20), 8651-8655, 2010 | 78 | 2010 |
| Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly RA Farrell, NT Kinahan, S Hansel, KO Stuen, N Petkov, MT Shaw, ... Nanoscale 4 (10), 3228-3236, 2012 | 68 | 2012 |
| “In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays T Ghoshal, R Senthamaraikannan, MT Shaw, JD Holmes, MA Morris Nanoscale 4 (24), 7743-7750, 2012 | 61 | 2012 |
| Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application T Ghoshal, T Maity, R Senthamaraikannan, MT Shaw, P Carolan, ... Scientific reports 3 (1), 2772, 2013 | 52 | 2013 |
| Structural and Magnetic Characterization of Ge0.99Mn0.01 Nanowire Arrays JS Kulkarni, O Kazakova, D Erts, MA Morris, MT Shaw, JD Holmes Chemistry of materials 17 (14), 3615-3619, 2005 | 50 | 2005 |
| Surface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanorings RA Farrell, N Kehagias, MT Shaw, V Reboud, M Zelsmann, JD Holmes, ... ACS nano 5 (2), 1073-1085, 2011 | 49 | 2011 |
| Synthesis and characterization of highly ordered cobalt–magnetite nanocable arrays B Daly, DC Arnold, JS Kulkarni, O Kazakova, MT Shaw, S Nikitenko, ... Small 2 (11), 1299-1307, 2006 | 48 | 2006 |
| Fabrication of ordered, large scale, horizontally aligned Si nanowire arrays based on an in-situ hard mask block copolymer approach T Ghoshal, R Senthamaraikannan, MT Shaw, JD Holmes, MA Morris Wiley, 2013 | 46 | 2013 |
| Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems D Borah, M Ozmen, S Rasappa, MT Shaw, JD Holmes, MA Morris Langmuir 29 (9), 2809-2820, 2013 | 46 | 2013 |
| Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography S Rasappa, D Borah, CC Faulkner, T Lutz, MT Shaw, JD Holmes, ... Nanotechnology 24 (6), 065503, 2013 | 41 | 2013 |
| Orientation and Alignment Control of Microphase-Separated PS-b-PDMS Substrate Patterns via Polymer Brush Chemistry D Borah, S Rasappa, R Senthamaraikannan, B Kosmala, MT Shaw, ... ACS Applied Materials & Interfaces 5 (1), 88-97, 2013 | 41 | 2013 |
| Achieving structural control with thin polystyrene-b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and … BMD O’Driscoll, RA Kelly, M Shaw, P Mokarian-Tabari, G Liontos, ... European Polymer Journal 49 (11), 3445-3454, 2013 | 36 | 2013 |
| Study on the combined effects of solvent evaporation and polymer flow upon block copolymer self-assembly and alignment on topographic patterns TG Fitzgerald, RA Farrell, N Petkov, CT Bolger, MT Shaw, JPF Charpin, ... Langmuir 25 (23), 13551-13560, 2009 | 35 | 2009 |
| Ordered mesoporous silicate structures as potential templates for nanowire growth RL Rice, DC Arnold, MT Shaw, D Iacopina, AJ Quinn, H Amenitsch, ... Advanced Functional Materials 17 (1), 133-141, 2007 | 35 | 2007 |
| Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design M Salaun, M Zelsmann, S Archambault, D Borah, N Kehagias, C Simao, ... Journal of Materials Chemistry C 1 (22), 3544-3550, 2013 | 34 | 2013 |
| Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process A Chaudhari, T Ghoshal, MT Shaw, C Cummins, D Borah, JD Holmes, ... Advances in Patterning Materials and Processes XXXI 9051, 254-263, 2014 | 27 | 2014 |
| Block copolymer lithography: feature size control and extension by an over-etch technique S Rasappa, D Borah, R Senthamaraikannan, CC Faulkner, MT Shaw, ... Thin Solid Films 522, 318-323, 2012 | 27 | 2012 |
