| 2022 Review of Data-Driven Plasma Science R Anirudh, R Archibald, MS Asif, MM Becker, S Benkadda, PT Bremer, ... IEEE Transactions on Plasma Science 51 (7), 1750-1838, 2023 | 40 | 2023 |
| Enhancement of the virtual metrology performance for plasma-assisted oxide etching processes by using plasma information (PI) parameters S Park, S Jeong, Y Jang, S Ryu, HJ Roh, GH Kim IEEE Transactions on Semiconductor Manufacturing 28 (3), 241-246, 2015 | 40 | 2015 |
| Development of the virtual metrology for the nitride thickness in multi-layer plasma-enhanced chemical vapor deposition using plasma-information variables HJ Roh, S Ryu, Y Jang, NK Kim, Y Jin, S Park, GH Kim IEEE Transactions on Semiconductor Manufacturing 31 (2), 232-241, 2018 | 34 | 2018 |
| Characteristics of a non-Maxwellian electron energy distribution in a low-pressure argon plasma S Park, JM Choe, HJ Roh, GH Kim Journal of the Korean Physical Society 64, 1819-1827, 2014 | 23 | 2014 |
| Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma JW Kwon, S Ryu, J Park, H Lee, Y Jang, S Park, GH Kim Materials 14 (11), 3005, 2021 | 22 | 2021 |
| Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth Y Jang, HJ Roh, S Park, S Jeong, S Ryu, JW Kwon, NK Kim, GH Kim Current Applied Physics 19 (10), 1068-1075, 2019 | 15 | 2019 |
| Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM S Park, Y Jang, T Cha, Y Noh, Y Choi, J Lee, J Seong, B Kim, T Cho, ... Physics of Plasmas 27 (8), 2020 | 14 | 2020 |
| Determination of electron energy probability function in low-temperature plasmas from current–Voltage characteristics of two Langmuir probes filtered by Savitzky–Golay and … HJ Roh, NK Kim, S Ryu, S Park, SH Lee, SR Huh, GH Kim Current Applied Physics 15 (10), 1173-1183, 2015 | 13 | 2015 |
| Application of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing S Park, T Cho, Y Jang, Y Noh, Y Choi, T Cha, J Lee, B Kim, JH Yang, ... Plasma Physics and Controlled Fusion 61 (1), 014032, 2018 | 12 | 2018 |
| Plasma information-based virtual metrology (PI-VM) and mass production process control S Park, J Seong, Y Jang, HJ Roh, JW Kwon, J Lee, S Ryu, J Song, ... Journal of the Korean Physical Society 80 (8), 647-669, 2022 | 11 | 2022 |
| Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing S Park, Y Kyung, J Lee, Y Jang, T Cha, Y Noh, Y Choi, B Kim, T Cho, ... Plasma Processes and Polymers 16 (9), 1900030, 2019 | 11 | 2019 |
| How to determine the relative ion concentrations of multiple-ion-species plasmas generated in the multi-dipole filament source NK Kim, SR Huh, HJ Roh, S Park, GH Kim Journal of Physics D: Applied Physics 48 (22), 225201, 2015 | 10 | 2015 |
| The effects of a self-regulation enhancement program on students' self-control, peer support, and class participation in elementary inclusive classrooms HY Roh, SH Park Posture for Restoring Identity of Korean Special Education, 412-428, 2016 | 9 | 2016 |
| Vacuum pump age effects by the exposure to the corrosive gases on the Cr etch rate as observed using optical emission spectroscopy in an Ar/O2/Cl2 mixed plasma S Park, HJ Roh, Y Jang, S Jeong, S Ryu, JM Choe, GH Kim Thin Solid Films 603, 154-159, 2016 | 8 | 2016 |
| Dust particle growth in rf silane plasmas using two-dimensional multi-pass laser light scattering KB Chai, CR Seon, S Park, W Choe New Journal of Physics 11 (10), 103006, 2009 | 8 | 2009 |
| Micro-range uniformity control of the etching profile in the OLED display mass production referring to the PI-VM model S Park, J Seong, Y Noh, Y Park, Y Jang, T Cho, JH Yang, GH Kim Physics of Plasmas 28 (10), 2021 | 6 | 2021 |
| Role of Features in Plasma Information Based Virtual Metrology (PI-VM) for SiO2 Etching Depth YC Jang, SH Park, SM Jeong, SW Ryu, GH Kim Journal of the Semiconductor & Display Technology 18 (4), 30-34, 2019 | 6 | 2019 |
| Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma H Lee, NK Kim, MG Lee, JW Kwon, SH Son, N Bae, T Park, S Park, ... Plasma Sources Science and Technology 31 (8), 084006, 2022 | 5 | 2022 |
| A Study on the Difference of Satisfaction and Achievement according to Development Type, Delivery Type and Operation Type in online contents of flipped learning in university HL Roh, MN Choi, SH Park Journal of Learner-Centered Curriculum and Instruction 17 (6), 419-440, 2017 | 5 | 2017 |
| Development of model predictive control of fluorine density in SF6/O2/Ar etch plasma by oxygen flow rate S Ryu, JW Kwon, J Park, I Lee, S Park, GH Kim Current Applied Physics 36, 183-186, 2022 | 4 | 2022 |
Gon-Ho KimProfessor, Seoul National University在 snu.ac.kr 的电子邮件经过验证
