| OES and FTIR diagnostics of HMDSO/O2 gas mixtures for SiOx deposition assisted by RF plasma M Goujon, T Belmonte, G Henrion Surface and Coatings Technology 188, 756-761, 2004 | 109 | 2004 |
| Characterization of a capacitively coupled RF plasma for SiO2 deposition: numerical and experimental results M Goujon, T Belmonte, G Henrion Thin Solid Films 475 (1-2), 118-123, 2005 | 5 | 2005 |
| Solar energy research and development program on the exploitation of the solar resource on the Réunion island and its integration into an electrical power grid M Goujon Person, O Delage, M Bessafi, JP Chabriat, P Jeanty Third Southern African Solar Energy Conference (SASEC 2015), Skukuza, South …, 2015 | 1 | 2015 |
| SOLAR ENERGY RESEARCH AND DEVELOPMENT PROGRAM ON THE EXPLOITATION OF THE SOLAR RESOURCE ON THE REUNION ISLAND AND ITS INTEGRATION INTO AN ELECTRICAL POWER GRID MG Person, O Delage, M Bessafi, JP Chabriat, P Jeanty Third Southern African Solar Energy Conference (SASEC 2015), 2015 | | 2015 |
| Solar energy research and development program on the exploitation of the solar resource on the Reunion Island and its integration into an electrical power grid O Delage, M Bessafi, JP Chabriat, P Jeanty, PM Goujon 3rd Southern African Solar Energy Conference, South Africa, 11-13 May, 2015., 2015 | | 2015 |
| TOPIC 2: GAS PHASE PLASMA DIAGNOSTICS M Goujon, G Henrion, T Belmonte, P Choquet, H Michel 17th International Symposium on Plasma Chemistry: Abstracts and Full-papers …, 2005 | | 2005 |
| Influence of the process parameters on both the plasma and the silicon oxide film properties in an O2/HMDSO PACVD process. M Goujon, G Henrion, T Belmonte, P Choquet, H Michel ISPC 17-17th Int. Symp. Plasma Chemistry, 2005 | | 2005 |
| Modelling andexperimental investigation of a low pressure O2/HMDSO radio-frequency plasma process for silicon oxide thin film deposition M Goujon < bound method Organization. get_name_with_acronym of< Organization …, 2004 | | 2004 |
| Modélisation et caractérisation expérimentale d'un procédé de dépôt de couches minces d'oxyde de silicium en plasma radiofréquence O2/HMDSO à basse pression M Goujon Institut National Polytechnique de Lorraine, 2004 | | 2004 |
