| Enhanced X-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double-nozzle setup H Fiedorowicz, A Bartnik, R Jarocki, R Rakowski, M Szczurek Applied Physics B 70, 305-308, 2000 | 139 | 2000 |
| A high-flux high-order harmonic source P Rudawski, CM Heyl, F Brizuela, J Schwenke, A Persson, E Mansten, ... Review of Scientific Instruments 84 (7), 2013 | 131 | 2013 |
| Compact laser plasma EUV source based on a gas puff target for metrology applications H Fiedorowicz, A Bartnik, R Jarocki, J Kostecki, J Krzywiński, ... Journal of Alloys and Compounds 401 (1-2), 99-103, 2005 | 94 | 2005 |
| Spatial and spectral properties of the high-order harmonic emission in argon for seeding applications X He, M Miranda, J Schwenke, O Guilbaud, T Ruchon, C Heyl, ... Physical Review A—Atomic, Molecular, and Optical Physics 79 (6), 063829, 2009 | 90 | 2009 |
| Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target R Rakowski, A Bartnik, H Fiedorowicz, F De Gaufridy De Dortan, ... Applied Physics B 101, 773-789, 2010 | 76 | 2010 |
| Interference effects in two-color high-order harmonic generation X He, JM Dahlström, R Rakowski, CM Heyl, A Persson, J Mauritsson, ... Physical Review A—Atomic, Molecular, and Optical Physics 82 (3), 033410, 2010 | 62 | 2010 |
| Short-wavelength ablation of molecular solids: pulse duration and wavelength effects L Juha, M Bittner, D Chvostová, J Krása, M Kozlová, M Pfeifer, J Polan, ... Journal of Micro/Nanolithography, MEMS and MOEMS 4 (3), 033007-033007-11, 2005 | 47 | 2005 |
| A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength PW Wachulak, A Bartnik, H Fiedorowicz, T Feigl, R Jarocki, J Kostecki, ... Applied Physics B 100, 461-469, 2010 | 45 | 2010 |
| Strong temperature effect on X-ray photo-etching of polytetrafluoroethylene using a 10 Hz laser-plasma radiation source based on a gas puff target A Bartnik, H Fiedorowicz, R Jarocki, L Juha, J Kostecki, R Rakowski, ... Applied Physics B 82, 529-532, 2006 | 45 | 2006 |
| Micromachining of organic polymers by direct photo-etching using a laser plasma X-ray source H Fiedorowicz, A Bartnik, M Bittner, L Juha, J Krasa, P Kubat, ... Microelectronic engineering 73, 336-339, 2004 | 36 | 2004 |
| Micromachining of organic polymers by X-ray photo-etching using a 10 Hz laser-plasma radiation source A Bartnik, H Fiedorowicz, R Jarocki, L Juha, J Kostecki, R Rakowski, ... Microelectronic engineering 78, 452-456, 2005 | 34 | 2005 |
| Pulsed X-ray radiography of a gas jet target for laser–matter interaction experiments with the use of a CCD detector R Rakowski, A Bartnik, H Fiedorowicz, R Jarocki, J Kostecki, J Mikołajczyk, ... Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2005 | 27 | 2005 |
| Femtosecond visible transient absorption spectroscopy of chlorophyll-f-containing photosystem II JJT Noura Zamzam, Rafal Rakowski, Marius Kaucikas, Gabriel Dorlhiac, Sefania ... PNAS, 2020 | 23* | 2020 |
| Metrology of high-order harmonics for free-electron laser seeding C Erny, E Mansten, M Gisselbrecht, J Schwenke, R Rakowski, X He, ... New Journal of Physics 13 (7), 073035, 2011 | 20 | 2011 |
| Soft x-ray emission from a double-stream gas puff target irradiated by a nanosecond laser pulse A Bartnik, H Fiedorowicz, R Rakowski, M Szczurek, F Bijkerk, R Bruijn, ... ECLIM 2000: 26th European Conference on Laser Interaction with Matter 4424 …, 2001 | 20 | 2001 |
| EUV emission from solids illuminated with a laser-plasma EUV source A Bartnik, H Fiedorowicz, R Jarocki, J Kostecki, R Rakowski, M Szczurek Applied Physics B 93, 737-741, 2008 | 17 | 2008 |
| Laser-produced plasma EUV source based on tin-rich, thin-layer targets R Rakowski, J Mikołajczyk, A Bartnik, H Fiedorowicz, ... Applied Physics B 102, 559-567, 2011 | 16 | 2011 |
| Micro-and nanoprocessing of polymers using a laser plasma extreme ultraviolet source A Bartnik, H Fiedorowicz, R Jarocki, J Kostecki, R Rakowski, A Szczurek, ... Acta Physica Polonica A 117 (2), 384-390, 2010 | 16 | 2010 |
| Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target R Rakowski, A Bartnik, H Fiedorowicz, R Jarocki, J Kostecki, J Krzywinski, ... Optica Applicata 36 (4), 593, 2006 | 14 | 2006 |
| Compact laser plasma EUV source based on a gas puff target for metrology H Fiedorowicz, A Bartnik, R Jarocki, J Kostecki, J Mikolajczyk, R Rakowski, ... Emerging Lithographic Technologies VII 5037, 389-396, 2003 | 13 | 2003 |
