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Paul Brunemeier
Paul Brunemeier
未知所在单位机构
在 brunemeier.com 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
Plasma-enhanced flash process
PE Brunemeier, T Miu
US Patent 5,869,401, 1999
341999
Photoluminescence measurements of band discontinuity in InP‐InGaPAs heterostructures
PE Brunemeier, DG Deppe, N Holonyak
Applied physics letters 46 (8), 755-757, 1985
251985
Inhomogeneous materials having physical properties decoupled from desired functions
PE Brunemeier, A Sengupta, JF Gaynor, RH Havemann
US Patent 6,873,026, 2005
222005
Inhomogeneity of liquid‐phase‐epitaxial InGaAsP lattice matched on InP: Effects of transient growth
PE Brunemeier, TJ Roth, N Holonyak Jr, GE Stillman
Journal of applied physics 56 (6), 1707-1716, 1984
221984
Interface abruptness and dissolution-induced “damage” in LPE InGaAsP heterostructures
PE Brunemeier, KC Hsieh, DG Deppe, JM Brown, N Holonyak Jr
Journal of crystal growth 71 (3), 705-710, 1985
191985
Method of fabricating group III-V compound
RD Remba, PE Brunemeier, BC Schmukler, WA Strifler, DH Rosenblatt
US Patent 5,374,328, 1994
171994
Measurement of compositional inhomogeneity of liquid phase epitaxial InGaPAs
PE Brunemeier, TJ Roth, N Holonyak Jr, GE Stillman
Applied physics letters 43 (4), 373-375, 1983
121983
Observation of gallium source ‘‘spitting’’
PE Brunemeier
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1991
101991
High-uniformity liquid phase epitaxial InGaAsP (λ= 1.3 μm)
PE Brunemeier, TJ Roth, N Holonyak Jr, GE Stillman
Journal of crystal growth 66 (2), 484-486, 1984
71984
Highly selective citric buffer etch-stop process for the manufacture of very uniform GaAs/AlGaAs FETs
BC Schmukler, PE Brunemeier, WR Hitchens, BD Cantos, WA Strifler, ...
15th Annual GaAs IC Symposium, 325-328, 1993
51993
Reduction of GaAs metal–semiconductor field effect transistor sidegating by ultraviolet/ozone cleanup prior to molecular‐beam epitaxial growth
WR Hitchens, PE Brunemeier, DM Dobkin
Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1989
51989
Method of fabricating group iii-v compound semiconductor devices using selective etching
RD Remba, PE Brunemeier, BC Schmukler, WA Strifler, DH Rosenblatt
31994
Liquid Phase Epitaxial Growth and Heterointerface Characteristics of Long-Wavelength Indium-Gallium Arsenide-Phosphide Heterostructures (Lasers, Semiconductors)
PE Brunemeier
University of Illinois at Urbana-Champaign, 1985
1985
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