| Lithographic apparatus and device manufacturing method J Lof, ETM Bijlaart, RAS Ritsema, F Van Schaik, TF Sengers, K Simon, ... US Patent 7,213,963, 2007 | 406 | 2007 |
| Lithographic apparatus and device manufacturing method TF Sengers, MA Van De Kerkhof, M Kroon, K Van Weert US Patent 7,907,255, 2011 | 215 | 2011 |
| Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations JJM Baselmans, MHP Moers, H Van Der Laan, RW Willekers, ... US Patent 6,650,399, 2003 | 165 | 2003 |
| Enabling sub-10nm node lithography: presenting the NXE: 3400B EUV scanner M van de Kerkhof, H Jasper, L Levasier, R Peeters, R van Es, JW Bosker, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 34-47, 2017 | 110 | 2017 |
| Lithographic focus and dose measurement using a 2-D target CM Leewis, HAJ Cramer, MA Van De Kerkhof, JA Quaedackers, ... US Patent 8,891,061, 2014 | 100 | 2014 |
| Full optical column characterization of DUV lithographic projection tools MA Van de Kerkhof, W de Boeij, H Kok, M Silova, J Baselmans, ... Optical Microlithography XVII 5377, 1960-1970, 2004 | 95 | 2004 |
| Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus AJ Den Boef, HAJ Cramer, MA Van De Kerkhof, HPM Pellemans, M Ebert US Patent 8,830,472, 2014 | 86 | 2014 |
| Inspection apparatus for lithography MA Van De Kerkhof, AGM Kiers, M van der Schaar, LHM Verstappen, ... US Patent 8,724,087, 2014 | 76 | 2014 |
| EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update R van Es, M van de Kerkhof, A Minnaert, G Fisser, J de Klerk, J Smits, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 102-113, 2018 | 67 | 2018 |
| Lithography for now and the future MA Van de Kerkhof, JPH Benschop, VY Banine Solid-State Electronics 155, 20-26, 2019 | 63 | 2019 |
| Lithographic apparatus and device manufacturing method TF Sengers, MA Van De Kerkhof, M Kroon, K Van Weert US Patent 8,035,798, 2011 | 63 | 2011 |
| EUV lithography at chipmakers has started: performance validation of ASML's NXE: 3100 C Wagner, J Bacelar, N Harned, E Loopstra, S Hendriks, I De Jong, ... Extreme Ultraviolet (EUV) Lithography II 7969, 499-510, 2011 | 60 | 2011 |
| Optimizing and enhancing optical systems to meet the low k1 challenge DG Flagello, RJ Socha, X Shi, JBP van Schoot, J Baselmans, ... Optical Microlithography XVI 5040, 139-150, 2003 | 58 | 2003 |
| New paradigm in lens metrology for lithographic scanner: evaluation and exploration K Lai, GM Gallatin, MA van de Kerkhof, W de Boeij, H Kok, M Schriever, ... Optical Microlithography XVII 5377, 160-171, 2004 | 40 | 2004 |
| Advanced particle contamination control in EUV scanners M van de Kerkhof, T van Empel, M Lercel, C Smeets, F van de Wetering, ... Extreme Ultraviolet (EUV) Lithography X 10957, 191-203, 2019 | 39 | 2019 |
| NXE pellicle: offering a EUV pellicle solution to the industry D Brouns, A Bendiksen, P Broman, E Casimiri, P Colsters, P Delmastro, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 567-576, 2016 | 39 | 2016 |
| Lithographic apparatus and device manufacturing method J Lof, ETM Bijlaart, RAS Ritsema, F Van Schaik, TF Sengers, K Simon, ... US Patent 8,482,845, 2013 | 38 | 2013 |
| Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system H Jasper, T Modderman, M van de Kerkhof, C Wagner, J Mulkens, ... Optical Microlithography XIX 6154, 651-664, 2006 | 35 | 2006 |
| High-power EUV lithography: spectral purity and imaging performance M van de Kerkhof, F Liu, M Meeuwissen, X Zhang, M Bayraktar, R de Kruif, ... Journal of micro/nanolithography, MEMS, and MOEMS 19 (3), 033801-033801, 2020 | 33 | 2020 |
| Understanding EUV-induced plasma and application to particle contamination control in EUV scanners M van de Kerkhof, A Yakunin, V Kvon, F van de Wetering, S Cats, ... Extreme ultraviolet (euv) lithography xi 11323, 239-250, 2020 | 33 | 2020 |
