Recent advances in convolutional neural network acceleration Q Zhang, M Zhang, T Chen, Z Sun, Y Ma, B Yu Neurocomputing 323, 37-51, 2019 | 426 | 2019 |
Parametric contrastive learning J Cui, Z Zhong, S Liu, B Yu, J Jia IEEE International Conference on Computer Vision (ICCV), 715-724, 2021 | 265 | 2021 |
Machine learning for electronic design automation: A survey G Huang, J Hu, Y He, J Liu, M Ma, Z Shen, J Wu, Y Xu, H Zhang, K Zhong, ... ACM Transactions on Design Automation of Electronic Systems (TODAES) 26 (5 …, 2021 | 215 | 2021 |
Provably secure camouflaging strategy for IC protection M Li, K Shamsi, T Meade, Z Zhao, B Yu, Y Jin, DZ Pan IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2017 | 193 | 2017 |
Layout decomposition for triple patterning lithography B Yu, K Yuan, D Ding, DZ Pan IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2015 | 185 | 2015 |
GAN-OPC: Mask optimization with lithography-guided generative adversarial nets H Yang, S Li, Y Ma, B Yu, EFY Young ACM/IEEE Design Automation Conference (DAC), 1-6, 2018 | 159 | 2018 |
Layout hotspot detection with feature tensor generation and deep biased learning H Yang, J Su, Y Zou, B Yu, EFY Young ACM/IEEE Design Automation Conference (DAC), 1-6, 2017 | 149 | 2017 |
Deepbillboard: Systematic physical-world testing of autonomous driving systems H Zhou, W Li, Z Kong, J Guo, Y Zhang, B Yu, L Zhang, C Liu IEEE/ACM International Conference on Software Engineering (ICSE), 347-358, 2020 | 138 | 2020 |
High performance graph convolutional networks with applications in testability analysis Y Ma, H Ren, B Khailany, H Sikka, L Luo, K Natarajan, B Yu ACM/IEEE Design Automation Conference (DAC), 1-6, 2019 | 120 | 2019 |
Imbalance aware lithography hotspot detection: a deep learning approach H Yang, L Luo, J Su, C Lin, B Yu Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (3), 033504-033504, 2017 | 116 | 2017 |
Design for manufacturing with emerging nanolithography DZ Pan, B Yu, JR Gao IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2013 | 111 | 2013 |
Optical proximity correction with hierarchical bayes model T Matsunawa, B Yu, DZ Pan Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (2), 021009-021009, 2016 | 105 | 2016 |
PCL: Proxy-based Contrastive Learning for Domain Generalization X Yao, Y Bai, X Zhang, Y Zhang, Q Sun, R Chen, R Li, B Yu IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), 7097-7107, 2022 | 98 | 2022 |
Enabling online learning in lithography hotspot detection with information-theoretic feature optimization H Zhang, B Yu, EFY Young IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 1-8, 2016 | 96 | 2016 |
A new lithography hotspot detection framework based on AdaBoost classifier and simplified feature extraction T Matsunawa, JR Gao, B Yu, DZ Pan Design-Process-Technology Co-optimization for Manufacturability IX 9427, 201-211, 2015 | 96 | 2015 |
EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation D Ding, B Yu, J Ghosh, DZ Pan IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), 263-270, 2012 | 91 | 2012 |
Dac-sdc low power object detection challenge for uav applications X Xu, X Zhang, B Yu, XS Hu, C Rowen, J Hu, Y Shi IEEE Transactions on Pattern Analysis and Machine Intelligence (TPAMI), 2019 | 89 | 2019 |
MOSAIC: Mask optimizing solution with process window aware inverse correction JR Gao, X Xu, B Yu, DZ Pan ACM/IEEE Design Automation Conference (DAC), 1-6, 2014 | 89 | 2014 |
Self-aligned double patterning aware pin access and standard cell layout co-optimization X Xu, B Cline, G Yeric, B Yu, DZ Pan ACM International Symposium on Physical Design (ISPD), 101-108, 2014 | 86 | 2014 |
PARR: Pin-access planning and regular routing for self-aligned double patterning X Xu, B Yu, JR Gao, CL Hsu, DZ Pan ACM Transactions on Design Automation of Electronic Systems (TODAES) 21 (3 …, 2016 | 78 | 2016 |