| The 2017 Plasma Roadmap: Low temperature plasma science and technology I Adamovich, SD Baalrud, A Bogaerts, PJ Bruggeman, M Cappelli, ... Journal of Physics D: Applied Physics 50 (32), 323001, 2017 | 982 | 2017 |
| The 2012 plasma roadmap S Samukawa, M Hori, S Rauf, K Tachibana, P Bruggeman, G Kroesen, ... Journal of Physics D: Applied Physics 45 (25), 253001, 2012 | 802 | 2012 |
| Dual mode inductively coupled plasma reactor with adjustable phase coil assembly S Banna, VN Todorow, KS Collins, A Nguyen, MJ Salinas, Z Chen, ... US Patent App. 12/821,636, 2011 | 505 | 2011 |
| Etch method in the manufacture of an integrated circuit TG Sparks, R Shahid US Patent App. 12/377,348, 2011 | 446 | 2011 |
| Symmetric plasma process chamber JD Carducci, H Tavassoli, A Balakrishna, Z Chen, A Nguyen, ... US Patent 9,741,546, 2017 | 353 | 2017 |
| Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution K Bera, S Rauf US Patent App. 12/004,448, 2009 | 343 | 2009 |
| Process for wafer backside polymer removal and wafer front side photoresist removal KS Collins, H Hanawa, A Nguyen, S Rauf, A Balakrishna, VN Todorow, ... US Patent 7,967,996, 2011 | 315 | 2011 |
| Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation S Rauf, MJ Kushner Journal of applied physics 85 (7), 3460-3469, 1999 | 310 | 1999 |
| Inductively coupled plasma source with symmetrical RF feed JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf US Patent 9,928,987, 2018 | 303 | 2018 |
| Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf US Patent 10,170,279, 2019 | 261 | 2019 |
| Fast atomic layer etch process using an electron beam A Agarwal, S Rauf, K Ramaswamy US Patent 9,362,131, 2016 | 261 | 2016 |
| Plasma reactor gas distribution plate with radially distributed path splitting manifold K Bera, S Rauf US Patent 8,512,509, 2013 | 238 | 2013 |
| Independent control of RF phases of separate coils of an inductively coupled plasma reactor KS Collins, S Kobayashi, L Wong, J Liu, Y Yang, K Ramaswamy, S Rauf US Patent 9,161,428, 2015 | 234 | 2015 |
| Argon metastable densities in radio frequency Ar, and electrical discharges S Rauf, MJ Kushner Journal of applied physics 82 (6), 2805-2813, 1997 | 234 | 1997 |
| Two-phase operation of plasma chamber by phase locked loop S Kobayashi, L Wong, J Liu, Y Yang, K Ramaswamy, S Rauf, SC Nevil, ... US Patent App. 13/632,302, 2013 | 200 | 2013 |
| Feol low-k spacers KS Collins, K Ramaswamy, Y Zhang, H Chang, L Dorf, MF Wu, S Rauf US Patent App. 14/323,855, 2016 | 169 | 2016 |
| Pulsed plasma high aspect ratio dielectric process A Agarwal, KS Collins, S Rauf, K Ramaswamy, TB Lill US Patent 8,382,999, 2013 | 155 | 2013 |
| Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources S Rauf, MJ Kushner IEEE Transactions on Plasma Science 27 (5), 1329-1338, 1999 | 151 | 1999 |
| Synchronized radio frequency pulsing for plasma etching B Liao, K Kawasaki, Y Pattar, SF Shoji, DD Nguyen, K Ramaswamy, ... US Patent 8,962,488, 2015 | 144 | 2015 |
| Workpiece support for a plasma reactor with controlled apportionment of rf power to a process kit ring KS Collins, DA Buchberger Jr, K Ramaswamy, S Rauf, H Hanawa, JY Sun, ... | 128 | 2010 |
Jason KenneyApplied Materials在 amat.com 的电子邮件经过验证
