Method of patterning a silicon nitride dielectric film SD Nemani, JT Pender, Q Zhou, D Lubomirsky, SG Belostotskiy US Patent 9,093,389, 2015 | 185 | 2015 |
Multi-mode etch chamber source assembly SG Belostotskiy, A Marcacci, K Ramaswamy, SD Nemani, A Nguyen, ... US Patent App. 13/893,199, 2014 | 185 | 2014 |
Near surface etch selectivity enhancement L Zhu, SS Kang, SD Nemani, SG Belostotskiy, JT Pender US Patent App. 13/970,481, 2014 | 183 | 2014 |
Pressure controller configuration for semiconductor processing applications SG Belostotskiy, A Nguyen, J Dinh, YS Lin US Patent App. 13/919,838, 2014 | 182 | 2014 |
Process chamber for etching low k and other dielectric films D Lubomirsky, S Nemani, E Yieh, SG Belostotskiy US Patent 9,666,414, 2017 | 163 | 2017 |
Method of patterning a low-k dielectric film SD Nemani, JT Pender, Q Zhou, D Lubomirsky, SG Belostotskiy US Patent 9,165,783, 2015 | 132 | 2015 |
Method of patterning a low-k dielectric film SD Nemani, JT Pender, Q Zhou, D Lubomirsky, SG Belostotskiy US Patent 8,802,572, 2014 | 126 | 2014 |
Negative ion destruction by O (3P) atoms and O2 (a 1Δg) molecules in an oxygen plasma SG Belostotsky, DJ Economou, DV Lopaev, TV Rakhimova Plasma Sources Science and Technology 14 (3), 532, 2005 | 115 | 2005 |
Silicon oxide recess etch N Fung, DT Or, Q Zhou, L Zhu, JT Pender, SD Nemani, SS Kang, ... US Patent 8,748,322, 2014 | 114 | 2014 |
Measurement of electron temperature and density in an argon microdischarge by laser Thomson scattering SG Belostotskiy, R Khandelwal, Q Wang, VM Donnelly, DJ Economou, ... Applied Physics Letters 92 (22), 2008 | 103 | 2008 |
Gas temperature and electron density profiles in an argon dc microdischarge measured by optical emission spectroscopy SG Belostotskiy, T Ouk, VM Donnelly, DJ Economou, N Sadeghi Journal of applied physics 107 (5), 2010 | 85 | 2010 |
Spatially Resolved Measurements of Argon Metastable Density in a High Pressure Microdischarge Using Diode Laser Absorption Spectroscopy SG Belostotskiy, VM Donnelly, DJ Economou, N Sadeghi IEEE Transactions on Plasma Science 37 (6), 852-858, 2009 | 74 | 2009 |
Time-and space-resolved measurements of Ar (1s5) metastable density in a microplasma using diode laser absorption spectroscopy SG Belostotskiy, T Ouk, VM Donnelly, DJ Economou, N Sadeghi Journal of Physics D: Applied Physics 44 (14), 145202, 2011 | 35 | 2011 |
Three-dimensional gas temperature measurements in atmospheric pressure microdischarges using Raman scattering SG Belostotskiy, Q Wang, VM Donnelly, DJ Economou, N Sadeghi Applied physics letters 89 (25), 2006 | 32 | 2006 |
Process chamber for etching low K and other dielectric films D Lubomirsky, S Nemani, E Yieh, SG Belostotskiy US Patent 10,923,367, 2021 | 31 | 2021 |
Influence of gas heating on high pressure dc microdischarge I–V characteristics SG Belostotskiy, VM Donnelly, DJ Economou Plasma Sources Science and Technology 17 (4), 045018, 2008 | 24 | 2008 |
Laser Thomson Scattering, Raman Scattering and laser-absorption diagnostics of high pressure microdischarges VM Donnelly, SG Belostotskiy, DJ Economou, N Sadeghi Journal of Physics: Conference Series 227 (1), 012011, 2010 | 9 | 2010 |
Temperature ramping using gas distribution plate heat SG Belostotskiy, C Dinh, Q Zhou, SD Nemani, A Nguyen US Patent 9,368,370, 2016 | 8 | 2016 |
Light efficiency of cathodoluminescent screens excited by a runaway electron beam SG Belostotsky, DV Lopaev, YA Mankelevich, EA Muratov, AT Rakhimov, ... Plasma physics reports 34, 969-977, 2008 | 8 | 2008 |
Investigation of H-production in plasma of dc glow discharge SG Belostotsky, DV Lopaev, TV Rakhimova Journal of Physics: Conference Series 44 (1), 162, 2006 | 6 | 2006 |