| Simulation of material sputtering with a focused ion beam NI Borgardt, RL Volkov, AV Rumyantsev, YA Chaplygin Technical Physics Letters 41, 610-613, 2015 | 27 | 2015 |
| Sputtering of redeposited material in focused ion beam silicon processing NI Borgardt, AV Rumyantsev, RL Volkov, YA Chaplygin Materials Research Express 5 (2), 025905, 2018 | 26 | 2018 |
| Prediction of surface topography due to finite pixel spacing in FIB milling of rectangular boxes and trenches NI Borgardt, AV Rumyantsev Journal of Vacuum Science & Technology B 34 (6), 2016 | 21 | 2016 |
| Study of silicon dioxide focused ion beam sputtering using electron microscopy imaging and level set simulation AV Rumyantsev, NI Borgardt, RL Volkov, YA Chaplygin Vacuum 202, 111128, 2022 | 14 | 2022 |
| Simulation of redeposited silicon sputtering under focused ion beam irradiation AV Rumyantsev, NI Borgardt, RL Volkov Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques …, 2018 | 12 | 2018 |
| Characterizing interface structure between crystalline and ion bombarded silicon by transmission electron microscopy and molecular dynamics simulations AV Rumyantsev, NI Borgardt, AS Prikhodko, YA Chaplygin Applied Surface Science 540, 148278, 2021 | 10 | 2021 |
| Prediction of surface topography due to finite pixel spacing in focused ion beam milling of circular holes and trenches AV Rumyantsev, NI Borgardt Journal of Vacuum Science & Technology B 36 (6), 2018 | 4 | 2018 |
| Features of the morphology and structure of thin silicon films AV Novak, VR Novak, DI Smirnov, AV Rumyantsev Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques …, 2021 | 2 | 2021 |
| Study of gallium-ion-induced silicon amorphization by matching experimental and simulated electron-microscopy images AV Rumyantsev, AS Prikhodko, NI Borgardt Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques …, 2020 | 2 | 2020 |
| Features of the manufacturing process of silicon needles for cantilevers AV Novak, VR Novak, AV Rumyantsev Russian Microelectronics 51 (7), 521-527, 2022 | 1 | 2022 |
| Level set simulation of focused ion beam sputtering of a multilayer substrate AV Rumyantsev, NI Borgardt, RL Volkov, YA Chaplygin Beilstein Journal of Nanotechnology 15 (1), 733-742, 2024 | | 2024 |
| Simulation of Silicon Carbide Sputtering by a Focused Gallium Ion Beam AV Rumyantsev, OV Podorozhniy, RL Volkov, NI Borgardt Semiconductors 56 (13), 487-492, 2022 | | 2022 |
