| Many routes to ferroelectric HfO2: A review of current deposition methods HA Hsain, Y Lee, M Materano, T Mittmann, A Payne, T Mikolajick, ... Journal of Vacuum Science & Technology A 40 (1), 2022 | 86 | 2022 |
| Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1− x)O2 thin films HA Hsain, Y Lee, G Parsons, JL Jones Applied Physics Letters 116 (19), 2020 | 74 | 2020 |
| Domains and domain dynamics in fluorite-structured ferroelectrics DH Lee, Y Lee, K Yang, JY Park, SH Kim, PRS Reddy, M Materano, ... Applied Physics Reviews 8 (2), 2021 | 64 | 2021 |
| A perspective on semiconductor devices based on fluorite-structured ferroelectrics from the materials–device integration perspective JY Park, K Yang, DH Lee, SH Kim, Y Lee, PR Reddy, JL Jones, MH Park Journal of Applied Physics 128 (24), 2020 | 61 | 2020 |
| Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum Y Lee, H Alex Hsain, SS Fields, ST Jaszewski, MD Horgan, PG Edgington, ... Applied Physics Letters 118 (1), 2021 | 32 | 2021 |
| Roadmap on ferroelectric hafnia-and zirconia-based materials and devices JPB Silva, R Alcala, UE Avci, N Barrett, L Bégon-Lours, M Borg, S Byun, ... APL Materials 11 (8), 2023 | 31 | 2023 |
| Temperature‐Dependent Phase Transitions in HfxZr1‐xO2 Mixed Oxides: Indications of a Proper Ferroelectric Material U Schroeder, T Mittmann, M Materano, PD Lomenzo, P Edgington, ... Advanced Electronic Materials 8 (9), 2200265, 2022 | 31 | 2022 |
| Morphology controlled Co-precipitation method for nano structured transparent MgAl2O4 S Nam, M Lee, BN Kim, Y Lee, S Kang Ceramics International 43 (17), 15352-15359, 2017 | 24 | 2017 |
| Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface HA Hsain, Y Lee, S Lancaster, PD Lomenzo, B Xu, T Mikolajick, ... Nanotechnology 34 (12), 125703, 2023 | 16 | 2023 |
| Effect of stress on fluorite-structured ferroelectric thin films for semiconductor devices Y Lee, HW Jeong, SH Kim, K Yang, MH Park Materials Science in Semiconductor Processing 160, 107411, 2023 | 12 | 2023 |
| Perspective on Ferroelectric Devices: Lessons from Interfacial Chemistry K Yang, SH Kim, HW Jeong, DH Lee, GH Park, Y Lee, MH Park Chemistry of Materials 35 (6), 2219-2237, 2023 | 12 | 2023 |
| Role of Oxygen Source on Buried Interfaces in Atomic-Layer-Deposited Ferroelectric Hafnia–Zirconia Thin Films HA Hsain, Y Lee, S Lancaster, M Materano, R Alcala, B Xu, T Mikolajick, ... ACS Applied Materials & Interfaces 14 (37), 42232-42244, 2022 | 12 | 2022 |
| Unveiled Ferroelectricity in Well‐Known Non‐Ferroelectric Materials and Their Semiconductor Applications DH Lee, Y Lee, YH Cho, H Choi, SH Kim, MH Park Advanced Functional Materials 33 (42), 2303956, 2023 | 9 | 2023 |
| A perspective on the physical scaling down of hafnia-based ferroelectrics JY Park, DH Lee, GH Park, J Lee, Y Lee, MH Park Nanotechnology 34 (20), 202001, 2023 | 9 | 2023 |
| The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2 Y Lee, RA Broughton, HA Hsain, SK Song, PG Edgington, MD Horgan, ... Journal of Applied Physics 132 (24), 2022 | 8 | 2022 |
| Approaches for characterizing surfaces damaged by disinfection in healthcare P Strader, Y Lee, P Teska, X Li, JL Jones Nano Life 9 (04), 1950002, 2019 | 7 | 2019 |
| Thermal stability of antiferroelectric-like Al: HfO2 thin films with TiN or Pt electrodes A Payne, H Alex Hsain, Y Lee, NA Strnad, JL Jones, B Hanrahan Applied Physics Letters 120 (23), 2022 | 5 | 2022 |
| Mitigation of field-driven dynamic phase evolution in ferroelectric Hf0.5Zr0.5O2 films by adopting oxygen-supplying electrode Y Lee, SH Kim, HW Jeong, GH Park, J Lee, YY Kim, MH Park Applied Surface Science 648, 158948, 2024 | 4 | 2024 |
| Effect of ferroelectric and interface films on the tunneling electroresistance of the Al2O3/Hf0.5Zr0.5O2 based ferroelectric tunnel junctions A Shekhawat, HA Hsain, Y Lee, JL Jones, S Moghaddam Nanotechnology 32 (48), 485204, 2021 | 4 | 2021 |
| Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition HA Hsain, Y Lee, PD Lomenzo, R Alcala, B Xu, T Mikolajick, U Schroeder, ... Journal of Applied Physics 133 (22), 2023 | 2 | 2023 |
