| PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads M Gebhard, L Mai, L Banko, F Mitschker, C Hoppe, M Jaritz, D Kirchheim, ... ACS applied materials & interfaces 10 (8), 7422-7434, 2018 | 45 | 2018 |
| Characterization of low-pressure microwave and radio frequency discharges in oxygen applying optical emission spectroscopy and multipole resonance probe S Steves, T Styrnoll, F Mitschker, S Bienholz, B Nikita, P Awakowicz Journal of Physics D: Applied Physics 46 (44), 445201, 2013 | 44 | 2013 |
| Influence of layer type and order on barrier properties of multilayer PECVD barrier coatings K Bahroun, H Behm, F Mitschker, P Awakowicz, R Dahlmann, ... Journal of Physics D: Applied Physics 47 (1), 015201, 2013 | 40 | 2013 |
| An efficient PE-ALD process for TiO 2 thin films employing a new Ti-precursor M Gebhard, F Mitschker, M Wiesing, I Giner, B Torun, T De Los Arcos, ... Journal of Materials Chemistry C 4 (5), 1057-1065, 2016 | 35 | 2016 |
| The effect of UV radiation from oxygen and argon plasma on the adhesion of organosilicon coatings on polypropylene M Jaritz, H Behm, C Hopmann, D Kirchheim, F Mitschker, P Awakowicz, ... Journal of Physics D: Applied Physics 50 (1), 015201, 2016 | 34 | 2016 |
| Inhibition of Interfacial Oxidative Degradation During SiOx Plasma Polymer Barrier Film Deposition on Model Organic Substrates B Ozkaya, F Mitschker, O Ozcan, P Awakowicz, G Grundmeier Plasma Processes and Polymers 12 (4), 392-397, 2015 | 31 | 2015 |
| In situ measurement of VUV/UV radiation from low-pressure microwave-produced plasma in Ar/O2 gas mixtures EJ Iglesias, F Mitschker, M Fiebrandt, N Bibinov, P Awakowicz Measurement Science and Technology 28 (8), 085501, 2017 | 30 | 2017 |
| Adhesion of plasma-deposited silicon oxide barrier layers on PDMS containing polypropylene C Hoppe, F Mitschker, P Awakowicz, D Kirchheim, R Dahlmann, ... Surface and Coatings Technology 335, 25-31, 2018 | 29 | 2018 |
| Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface‐Near Regions During the Deposition of SiOx Films F Mitschker, J Dietrich, B Ozkaya, T de los Arcos, I Giner, P Awakowicz, ... Plasma Processes and Polymers 12 (9), 1002-1009, 2015 | 28 | 2015 |
| From precursor chemistry to gas sensors: Plasma‐enhanced atomic layer deposition process engineering for zinc oxide layers from a nonpyrophoric zinc precursor for gas barrier … L Mai, F Mitschker, C Bock, A Niesen, E Ciftyurek, D Rogalla, J Mickler, ... Small 16 (22), 1907506, 2020 | 24 | 2020 |
| Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO) F Mitschker, L Schücke, C Hoppe, M Jaritz, R Dahlmann, T De Los Arcos, ... Journal of Physics D: Applied Physics 51 (23), 235201, 2018 | 22 | 2018 |
| Unearthing [3‐(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and … L Mai, M Gebhard, T de Los Arcos, I Giner, F Mitschker, M Winter, ... Chemistry–A European Journal 23 (45), 10768-10772, 2017 | 21 | 2017 |
| Adhesion of Thin CVD Films on Pulsed Plasma Pre‐Treated Polypropylene H Behm, K Bahroun, H Bahre, D Kirchheim, F Mitschker, N Bibinov, ... Plasma Processes and Polymers 11 (5), 418-425, 2014 | 21 | 2014 |
| A numerical analysis of a microwave induced coaxial surface wave discharge fed with a mixture of oxygen and hexamethyldisiloxane for the purpose of deposition E Kemaneci, F Mitschker, J Benedikt, D Eremin, P Awakowicz, ... Plasma Sources Science and Technology 28 (11), 115003, 2019 | 19 | 2019 |
| Influence of organic surface chemistry on the nucleation of plasma deposited SiOx films C Hoppe, F Mitschker, I Giner, T de Los Arcos, P Awakowicz, ... Journal of Physics D: Applied Physics 50 (20), 204002, 2017 | 19 | 2017 |
| Time-resolved measurement of film growth during high-power pulsed magnetron sputtering (HIPIMS) of titanium F Mitschker, M Prenzel, J Benedikt, C Maszl, A Von Keudell Journal of Physics D: Applied Physics 46 (15), 155204, 2013 | 18 | 2013 |
| A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD M Gebhard, F Mitschker, C Hoppe, M Aghaee, D Rogalla, M Creatore, ... Plasma Processes and Polymers 15 (5), 1700209, 2018 | 17 | 2018 |
| Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence F Mitschker, S Steves, M Gebhard, M Rudolph, L Schücke, D Kirchheim, ... Journal of Physics D: Applied Physics 50 (23), 235201, 2017 | 17 | 2017 |
| Mechanisms of oxygen permeation through plastic films and barrier coatings S Wilski, J Wipperfürth, M Jaritz, D Kirchheim, F Mitschker, P Awakowicz, ... Journal of Physics D: Applied Physics 50 (42), 425301, 2017 | 16 | 2017 |
| A global model of cylindrical and coaxial surface-wave discharges E Kemaneci, F Mitschker, M Rudolph, D Szeremley, D Eremin, ... Journal of Physics D: Applied Physics 50 (24), 245203, 2017 | 14 | 2017 |
