关注
Filippo Giannazzo
Filippo Giannazzo
CNR, Istituto per la Microelettronica e i Microsistemi, Catania, Italy
在 imm.cnr.it 的电子邮件经过验证
标题
引用次数
年份
2D graphitic-like gallium nitride and other structural selectivity in confinement at the graphene/SiC interface
G Sfuncia, G Nicotra, F Giannazzo, B Pécz, GK Gueorguiev, ...
CrystEngComm 25 (41), 5810-5817, 2023
232023
2D graphitic-like gallium nitride and structural selectivity in confinement at graphene/SiC interface
G Sfuncia, G Nicotra, F Giannazzo, B Pécz, GK Gueorguiev, ...
arXiv preprint arXiv:2206.10247, 2022
2022
A comprehensive study on the physicochemical and electrical properties of Si doped with the molecular doping method
RA Puglisi, S Caccamo, L D'Urso, G Fisichella, F Giannazzo, M Italia, ...
physica status solidi (a) 212 (8), 1685-1694, 2015
212015
A look underneath the SiO2/4H-SiC interface after N2O thermal treatments
P Fiorenza, F Giannazzo, LK Swanson, A Frazzetto, S Lorenti, ...
Beilstein Journal of Nanotechnology 4 (1), 249-254, 2013
202013
A Nanoscale Look in the Channel of 4H-SiC Lateral MOSFETs
P Fiorenza, A Frazzetto, LK Swanson, F Giannazzo, F Roccaforte
Materials Science Forum 740, 699-702, 2013
12013
A review on metal nanoparticles nucleation and growth on/in graphene
F Ruffino, F Giannazzo
Crystals 7 (7), 219, 2017
442017
Acceptor, compensation, and mobility profiles in multiple Al implanted 4H‐SiC
F Giannazzo, F Roccaforte, V Raineri
Applied Physics Letters 91 (20), 2007
592007
Activation Study of Implanted N+ in 6H-SiC by Scanning Capacitance Microscopy
V Raineri, L Calcagno, F Giannazzo, D Goghero, F Musumeci, ...
Materials Science Forum 433, 375-378, 2003
102003
Active dopant profiling and Ohmic contacts behavior in degenerate n-type implanted silicon carbide
M Spera, G Greco, A Severino, M Vivona, P Fiorenza, F Giannazzo, ...
Applied Physics Letters 117 (1), 2020
82020
Advanced materials nanocharacterization
F Giannazzo, P Eyben, J Baranowski, J Camassel, S Lányi
Nanoscale research letters 6, 1-2, 2011
82011
Advances in the fabrication of graphene transistors on flexible substrates
G Fisichella, SL Verso, S Di Marco, V Vinciguerra, E Schilirò, S Di Franco, ...
Beilstein Journal of Nanotechnology 8 (1), 467-474, 2017
222017
Advances in the Fabrication of Large-Area Back-Gated Graphene Field-Effect Transistors on Plastics: Platform for Flexible Electronics and Sensing
G Fisichella, S Lo Verso, S Di Marco, V Vinciguerra, E Schilirò, ...
GraphITA: Selected papers from the Workshop on Synthesis, Characterization …, 2017
2017
Al2O3 Layers Grown by Atomic Layer Deposition as Gate Insulator in 3C-SiC MOS Devices
E Schilirò, P Fiorenza, R Lo Nigro, B Galizia, G Greco, S Di Franco, ...
Materials 16 (16), 5638, 2023
22023
Aluminum oxide nucleation in the early stages of atomic layer deposition on epitaxial graphene
E Schilirò, RL Nigro, SE Panasci, FM Gelardi, S Agnello, R Yakimova, ...
Carbon 169, 172-181, 2020
262020
Ambipolar MoS2 Transistors by Nanoscale Tailoring of Schottky Barrier Using Oxygen Plasma Functionalization
F Giannazzo, G Fisichella, G Greco, S Di Franco, I Deretzis, A La Magna, ...
ACS Applied Materials & Interfaces 9 (27), 23164-23174, 2017
922017
Analysis of the Electrical Activation of P+ Implanted Layers as a Function of the Heating Rate of the Annealing Process
M Canino, F Giannazzo, F Roccaforte, A Poggi, S Solmi, V Raineri, ...
Materials science forum 556, 571-574, 2007
22007
Anchoring molecular magnets on the Si (100) surface
GG Condorelli, A Motta, IL Fragalà, F Giannazzo, V Raineri, A Caneschi, ...
ANGEWANDTE CHEMIE. INTERNATIONAL EDITION 43, 4081-4084, 2004
1232004
Annealing temperature dependence of the electrically active profiles and surface roughness in multiple Al implanted 4H-SiC
F Giannazzo, F Roccaforte, D Salinas, V Raineri
Materials Science Forum 768 (600), 603, 2008
12008
Anomalous Fowler-Nordheim Tunneling through SiO2/4H-SiC Barrier Investigated by Temperature and Time Dependent Gate Current Measurements
P Fiorenza, A La Magna, M Vivona, F Giannazzo, F Roccaforte
Materials Science Forum 897, 123-126, 2017
12017
Assessing the performance of two and three dimensional dopant profiling techniques for sub-65nm technologies
P Eyben, J Mody, SC Vemula, S Koelling, R Verheyden, W Vandervorst, ...
2007
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