Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development G O’Sullivan, B Li, R D’Arcy, P Dunne, P Hayden, D Kilbane, ... Journal of Physics B: Atomic, Molecular and Optical Physics 48 (14), 144025, 2015 | 131 | 2015 |
Feasibility study of broadband efficient “water window” source T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, B Li, P Dunne, ... Applied Physics Letters 100 (1), 2012 | 96 | 2012 |
Extreme ultraviolet source at 6.7 nm based on a low-density plasma T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, B Li, D Kilbane, ... Applied Physics Letters 99 (19), 2011 | 86 | 2011 |
Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma T Cummins, T Otsuka, N Yugami, W Jiang, A Endo, B Li, C O’Gorman, ... Applied Physics Letters 100 (6), 2012 | 65 | 2012 |
Quasi-Moseley's law for strong narrow bandwidth soft x-ray sources containing higher charge-state ions H Ohashi, T Higashiguchi, Y Suzuki, G Arai, Y Otani, T Yatagai, B Li, ... Applied Physics Letters 104 (23), 2014 | 63 | 2014 |
Characteristics of extreme ultraviolet emission from mid-infrared laser-produced rare-earth Gd plasmas T Higashiguchi, B Li, Y Suzuki, M Kawasaki, H Ohashi, S Torii, ... Optics Express 21 (26), 31837-31845, 2013 | 60 | 2013 |
Gd plasma source modeling at 6.7 nm for future lithography B Li, P Dunne, T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, ... Applied Physics Letters 99 (23), 2011 | 40 | 2011 |
Sources for beyond extreme ultraviolet lithography and water window imaging G O’Sullivan, B Li, P Dunne, P Hayden, D Kilbane, R Lokasani, E Long, ... Physica Scripta 90 (5), 054002, 2015 | 36 | 2015 |
Investigation of Gd and Tb plasmas for beyond extreme ultraviolet lithography based on multilayer mirror performance B Li, T Otsuka, T Higashiguchi, N Yugami, W Jiang, A Endo, P Dunne, ... Applied Physics Letters 101 (1), 2012 | 35 | 2012 |
Efficient extreme ultraviolet emission from one-dimensional spherical plasmas produced by multiple lasers K Yoshida, S Fujioka, T Higashiguchi, T Ugomori, N Tanaka, H Ohashi, ... Applied Physics Express 7 (8), 086202, 2014 | 34 | 2014 |
Dielectronic recombination of Rh-like Gd and W BW Li, G O’Sullivan, YB Fu, CZ Dong Physical Review A—Atomic, Molecular, and Optical Physics 85 (5), 052706, 2012 | 32 | 2012 |
“Water window” sources: Selection based on the interplay of spectral properties and multilayer reflection bandwidth B Li, T Higashiguchi, T Otsuka, W Jiang, A Endo, P Dunne, G O'Sullivan Applied Physics Letters 102 (4), 2013 | 30 | 2013 |
Spectral investigation of highly ionized bismuth plasmas produced by subnanosecond Nd: YAG laser pulses T Wu, T Higashiguchi, B Li, G Arai, H Hara, Y Kondo, T Miyazaki, TH Dinh, ... Journal of Physics B: Atomic, Molecular and Optical Physics 49 (3), 035001, 2016 | 28 | 2016 |
Soft X-ray emission from molybdenum plasmas generated by dual laser pulses R Lokasani, G Arai, Y Kondo, H Hara, TH Dinh, T Ejima, T Hatano, ... Applied Physics Letters 109 (19), 2016 | 27 | 2016 |
Tuning extreme ultraviolet emission for optimum coupling with multilayer mirrors for future lithography through control of ionic charge states H Ohashi, T Higashiguchi, B Li, Y Suzuki, M Kawasaki, T Kanehara, ... Journal of Applied Physics 115 (3), 2014 | 27 | 2014 |
The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nm C O’Gorman, T Otsuka, N Yugami, W Jiang, A Endo, B Li, T Cummins, ... Applied Physics Letters 100 (14), 2012 | 24 | 2012 |
Relativistic R-matrix calculation photoionization cross section of Xe and Xe@ C60 B Li, G O'Sullivan, C Dong Journal of Physics B: Atomic, Molecular and Optical Physics 46 (15), 155203, 2013 | 22 | 2013 |
A 6.7-nm beyond EUV source as a future lithography source T Otsuka, B Li, C O'Gorman, T Cummins, D Kilbane, T Higashiguchi, ... Extreme Ultraviolet (EUV) Lithography III 8322, 342-351, 2012 | 22 | 2012 |
Fisher information for endohedrally confined hydrogen atom L Wu, S Zhang, B Li Physics Letters A 384 (1), 126033, 2020 | 20 | 2020 |
XUV spectra of laser-produced zirconium plasmas B Li, T Higashiguchi, T Otsuka, W Jiang, A Endo, P Dunne, G O'Sullivan Journal of Physics B: Atomic, Molecular and Optical Physics 45 (24), 245004, 2012 | 20 | 2012 |