| PET/MRI in head and neck cancer: initial experience I Platzek, B Beuthien-Baumann, M Schneider, V Gudziol, J Langner, ... European journal of nuclear medicine and molecular imaging 40, 6-11, 2013 | 166* | 2013 |
| Spin-spin cross relaxation in single-molecule magnets W Wernsdorfer, S Bhaduri, R Tiron, DN Hendrickson, G Christou Physical review letters 89 (19), 197201, 2002 | 141 | 2002 |
| Strain-induced magnetic anisotropy in epitaxial manganite films L Ranno, A Llobet, R Tiron, E Favre-Nicolin Applied surface science 188 (1-2), 170-175, 2002 | 132 | 2002 |
| Spin Quantum Tunneling via Entangled States in a Dimer<? format?> of Exchange-Coupled Single-Molecule Magnets R Tiron, W Wernsdorfer, D Foguet-Albiol, N Aliaga-Alcalde, G Christou Physical review letters 91 (22), 227203, 2003 | 101 | 2003 |
| Quantum tunneling in a three-dimensional network of exchange-coupled single-molecule magnets R Tiron, W Wernsdorfer, N Aliaga-Alcalde, G Christou Physical Review B 68 (14), 140407, 2003 | 85 | 2003 |
| DNA origami mask for sub-ten-nanometer lithography CT Diagne, C Brun, D Gasparutto, X Baillin, R Tiron ACS nano 10 (7), 6458-6463, 2016 | 63 | 2016 |
| The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication R Tiron, A Gharbi, M Argoud, X Chevalier, J Belledent, PP Barros, I Servin, ... Alternative Lithographic Technologies V 8680, 191-201, 2013 | 52 | 2013 |
| Optimization of block copolymer self-assembly through graphoepitaxy: a defectivity study R Tiron, X Chevalier, C Couderc, J Pradelles, J Bustos, L Pain, C Navarro, ... Journal of Vacuum Science & Technology B 29 (6), 2011 | 48 | 2011 |
| Hyperbranched polymers for photolithographic applications–Towards understanding the relationship between chemical structure of polymer resin and lithographic performances CL Chochos, E Ismailova, C Brochon, N Leclerc, R Tiron, C Sourd, ... Advanced Materials 21 (10‐11), 1121-1125, 2009 | 48 | 2009 |
| HBr plasma treatment versus VUV light treatment to improve 193 nm photoresist pattern linewidth roughness E Pargon, L Azarnouche, M Fouchier, K Menguelti, R Tiron, C Sourd, ... Plasma Processes and Polymers 8 (12), 1184-1195, 2011 | 46 | 2011 |
| Study of dynamical formation and shape of microlenses formed by the reflow method S Audran, B Faure, B Mortini, C Aumont, R Tiron, C Zinck, Y Sanchez, ... Advances in Resist Technology and Processing XXIII 6153, 1368-1377, 2006 | 34 | 2006 |
| Etch challenges for DSA implementation in CMOS via patterning PP Barros, S Barnola, A Gharbi, M Argoud, I Servin, R Tiron, X Chevalier, ... Advanced Etch Technology for Nanopatterning III 9054, 87-96, 2014 | 32 | 2014 |
| Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements R Tiron, X Chevalier, S Gaugiran, J Pradelles, H Fontaine, C Couderc, ... Alternative Lithographic Technologies IV 8323, 135-141, 2012 | 32 | 2012 |
| Template affinity role in CH shrink by DSA planarization R Tiron, A Gharbi, PP Barros, S Bouanani, C Lapeyre, S Bos, A Fouquet, ... Alternative Lithographic Technologies VII 9423, 245-255, 2015 | 29 | 2015 |
| PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication A Gharbi, R Tiron, P Pimenta Barros, M Argoud, I Servin, X Chevalier, ... Journal of Vacuum Science & Technology B 33 (5), 2015 | 28 | 2015 |
| Probing self-assembly of cylindrical morphology block copolymer using in situ and ex situ grazing incidence small-angle X-ray scattering: the attractive case of graphoepitaxy M Maret, R Tiron, X Chevalier, P Gergaud, A Gharbi, C Lapeyre, ... Macromolecules 47 (20), 7221-7229, 2014 | 28 | 2014 |
| 300mm pilot line DSA contact hole process stability M Argoud, I Servin, A Gharbi, PP Barros, K Jullian, M Sanche, ... Alternative Lithographic Technologies VI 9049, 474-484, 2014 | 28 | 2014 |
| Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line I Servin, R Tiron, A Gharbi, M Argoud, K Jullian, G Chamiot-Maitral, ... Japanese Journal of Applied Physics 53 (6S), 06JC05, 2014 | 25 | 2014 |
| Ultrahigh-resolution pattern using electron-beam lithography HF wet etching R Tiron, L Mollard, O Louveau, E Lajoinie Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 24 | 2007 |
| Investigation of block depth distribution in PS‐b‐PMMA block copolymer using ultra‐low‐energy cesium sputtering in ToF‐SIMS T Terlier, R Tiron, A Gharbi, X Chevalier, M Veillerot, E Martinez, ... Surface and Interface Analysis 46 (2), 83-91, 2014 | 23 | 2014 |
Christophe NavarroArkema在 arkema.com 的电子邮件经过验证
