| Y-doped HfO2 deposited by atomic layer deposition using a cocktail precursor for DRAM capacitor dielectric application J Kim, BS Kim, AJ Lee, DH Han, JH Hwang, Y Kim, KC Song, H Oh, S Kim, ... Ceramics International 48 (3), 3236-3242, 2022 | 16 | 2022 |
| Reliable high work-function molybdenum dioxide synthesis via template-effect-utilizing atomic layer deposition for next-generation electrode applications YW Kim, AJ Lee, DH Han, DC Lee, JH Hwang, Y Kim, S Moon, T Youn, ... Journal of Materials Chemistry C 10 (36), 12957-12965, 2022 | 15 | 2022 |
| Enhancing chemisorption efficiency and thin-film characteristics via a discrete feeding method in high-k dielectric atomic layer deposition for preventing interfacial layer … AJ Lee, S Lee, DH Han, Y Kim, W Jeon Journal of Materials Chemistry C 11 (21), 6894-6901, 2023 | 10 | 2023 |
| An Empirical Investigation on the Effect of Oxygen Vacancy in ZrO2 Thin Film on the Frequency-Dependent Capacitance Degradation in the Metal–Insulator–Metal … DH Han, S Lee, JH Hwang, Y Kim, M Bonvalot, C Vallée, P Gonon, ... IEEE Transactions on Electron Devices 68 (11), 5753-5757, 2021 | 9 | 2021 |
| Chemistry of ruthenium as an electrode for metal–insulator–metal capacitor application EY Jung, J Bang, JH Hwang, DH Han, Y Kim, H Kim, W Jeon Nanotechnology 32 (4), 045201, 2020 | 7 | 2020 |
| An Al-doped TiO 2 interfacial layer for effective hole injection characteristics of quantum-dot light-emitting diodes MG Kim, JS Shin, JH Ma, JH Jeong, DH Han, BS Kim, W Jeon, Y Park, ... Journal of Materials Chemistry C 10 (18), 7294-7303, 2022 | 4 | 2022 |
| Wake-Up and Endurance Characteristics in Hf0.5Zr0.5O2-Based Metal-Ferroelectric-Metal Capacitor Depending on the Crystal Orientation of the TiN Bottom … DH Han, AJ Lee, MK Nam, S Lee, SJ Choi, Y Kim, T Moon, W Jeon IEEE Transactions on Electron Devices 70 (4), 1983-1988, 2023 | 1 | 2023 |
| Suppressing Interfacial Layer Formation in ZrO2-Based Capacitors with TiN Electrodes via a MgO Thin-Film Oxygen Diffusion Barrier S Lee, HH Seol, MK Nam, DH Han, D Kim, H Oh, H Kim, Y Park, Y Kim, ... ACS Applied Electronic Materials 6 (5), 3362-3373, 2024 | | 2024 |
| Investigating dielectric relaxation currents for a deeper understanding of capacitance and interface in metal-insulator-metal capacitor DH Han, SJ Choi, Y Kim, W Jeon IEEE Transactions on Dielectrics and Electrical Insulation, 2023 | | 2023 |
| Reliable high work-function molybdenum dioxide synthesis via template-effect-utilizing atomic layer deposition for next-generation electrode applications (Aug, 10.1039 … YW Kim, AJ Lee, DH Han, DC Lee, JH Hwang, Y Kim, S Moon, T Youn, ... JOURNAL OF MATERIALS CHEMISTRY C 10 (36), 13268-13269, 2022 | | 2022 |
