关注
Florian Käfer
Florian Käfer
Postdoctoral Associate
在 cornell.edu 的电子邮件经过验证
标题
引用次数
引用次数
年份
LCST and UCST in One: Double Thermoresponsive Behavior of Block Copolymers of Poly(ethylene glycol) and Poly(acrylamide-co-acrylonitrile)
F Käfer, F Liu, U Stahlschmidt, V Jérôme, R Freitag, M Karg, S Agarwal
Langmuir 31 (32), 8940-8946, 2015
942015
Let there be light: Polymeric micelles with upper critical solution temperature as light‐triggered heat nanogenerators for combating drug‐resistant cancer
Y Deng, F Käfer, T Chen, Q Jin, J Ji, S Agarwal
Small 14 (37), 1802420, 2018
732018
Tunable, concentration‐independent, sharp, hysteresis‐free UCST phase transition from poly(N‐acryloyl glycinamide‐acrylonitrile) system
F Käfer, A Lerch, S Agarwal
Journal of Polymer Science Part A: Polymer Chemistry 55 (2), 274-279, 2017
352017
Tuning the Phase Transition from UCST‐Type to LCST‐Type by Composition Variation of Polymethacrylamide Polymers
F Käfer, M Pretscher, S Agarwal
Macromolecular Rapid Communications 39 (24), 1800640, 2018
232018
Recent developments in photoresists for extreme-ultraviolet lithography
CK Ober, F Käfer, C Yuan
Polymer 280, 126020, 2023
222023
Review of essential use of fluorochemicals in lithographic patterning and semiconductor processing
CK Ober, F Käfer, J Deng
Journal of Micro/Nanopatterning, Materials, and Metrology 21 (1), 010901-010901, 2022
222022
New Approaches to EUV Photoresists: Studies of Polyacetals and Polypeptoids to Expand the Photopolymer Toolbox
J Deng, F Kaefer, S Bailey, Y Otsubo, Z Meng, R Segalman, CK Ober
Journal of photopolymer science and technology 34 (1), 71-74, 2021
82021
Controlled sequence photoresists from polypeptoids
F Kaefer, Z Meng, R Segalman, CK Ober
Journal of Photopolymer Science and Technology 35 (1), 29-33, 2022
62022
Polymer‐Grafted Nanoparticles (PGNs) with Adjustable Graft‐Density and Interparticle Hydrogen Bonding Interaction
C Yuan, F Käfer, CK Ober
Macromolecular Rapid Communications 43 (12), 2100629, 2022
62022
Effect of monomer hydrophilicity on ARGET–ATRP kinetics in aqueous mini‐emulsion polymerization
A Cintora, F Käfer, C Yuan, CK Ober
Journal of Polymer Science 60 (4), 666-673, 2022
62022
Structural Insights into Polymethacrylamide-Based LCST Polymers in Solution: A Small-Angle Neutron Scattering Study
A Lerch, F Käfer, S Prévost, S Agarwal, M Karg
Macromolecules 54 (16), 7632-7641, 2021
52021
Silica‐PMMA hairy nanoparticles prepared via phase transfer‐assisted aqueous miniemulsion atom transfer radical polymerization
DY Wu, F Käfer, N Diaco, CK Ober
Journal of Polymer Science 58 (17), 2310-2316, 2020
42020
Interpenetrating thermophobic and thermophilic dual responsive networks
F Käfer, Y Hu, YJ Wang, ZL Wu, S Agarwal
Journal of Polymer Science Part A: Polymer Chemistry 57 (4), 539-544, 2019
42019
Polypeptoids: Exploring the Power of Sequence Control in a Photoresist for Extreme‐Ultraviolet Lithography
F Käfer, C Wang, Y Huang, F Bard, R Segalman, CK Ober
Advanced Materials Technologies 8 (23), 2301104, 2023
22023
Synthesis of N‐Substituted Maleimides and Poly(styrene‐coN‐maleimide) Copolymers and Their Potential Application as Photoresists
GA Eken, F Käfer, C Yuan, I Andrade, CK Ober
Macromolecular Chemistry and Physics 224 (1), 2200256, 2023
22023
Controlled sequence peptoids as photoresist platforms for high-resolution DUV/EUV photoresists
XZ Meng, FH Käfer, GM Wallraff, CK Ober, RA Segalman
International Conference on Extreme Ultraviolet Lithography 2022 12292, 208-213, 2022
22022
Controlled‐Release LCST‐Type Nonwoven Depots via Squeezing‐Out Thermal Response
F Käfer, R Vilensky, G Vasilyev, E Zussman, S Agarwal
Macromolecular Materials and Engineering 304 (3), 1800606, 2019
22019
Sequence-defined polypeptoid CARs for electron-beam and EUV lithography
F Kaefer, CK Ober, Z Meng, R Segalman, JR de Alaniz
Advances in Patterning Materials and Processes XL 12498, 222-226, 2023
12023
Controlling Anti-Penetration Performance by Post-Grafting of Fluorinated Alkyl Chains onto Polystyrene-block-poly(vinyl methyl siloxane)
Z Zhang, K Chaudhuri, F Kaefer, AP Malanoski, KA Page, LM Smieska, ...
ACS Applied Materials & Interfaces 16 (15), 19594-19604, 2024
2024
Sequence-defined polypeptoids as DUV and EUV chemically amplified resists
CP Adams, X Meng, FH Kaefer, C Yuan, CK Ober, RA Segalman
International Conference on Extreme Ultraviolet Lithography 2023, PC127500J, 2023
2023
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