| Citric acid as a complexing agent in chemical mechanical polishing slurries for cobalt films for interconnect applications R Popuri, KV Sagi, SR Alety, BC Peethala, H Amanapu, R Patlolla, ... ECS Journal of Solid State Science and Technology 6 (9), P594, 2017 | 78 | 2017 |
| Ammonium persulfate and potassium oleate containing silica dispersions for chemical mechanical polishing for cobalt interconnect applications CK Ranaweera, NK Baradanahalli, R Popuri, J Seo, SV Babu ECS Journal of Solid State Science and Technology 8 (5), P3001, 2018 | 68 | 2018 |
| Potassium oleate as a dissolution and corrosion inhibitor during chemical mechanical planarization of chemical vapor deposited Co films for interconnect applications R Popuri, H Amanapu, CK Ranaweera, NK Baradanahalli, SV Babu ECS Journal of Solid State Science and Technology 6 (12), P845, 2017 | 58 | 2017 |
| Cleaning solutions for ultrathin Co barriers for advanced technology nodes SR Alety, URK Lagudu, R Popuri, R Patlolla, CVVS Surisetty, SV Babu ECS Journal of Solid State Science and Technology 6 (9), P671, 2017 | 36 | 2017 |
| Soft chemical mechanical polishing pad for oxide CMP applications NB Kenchappa, R Popuri, A Chockkalingam, P Jawali, S Jayanath, ... ECS Journal of Solid State Science and Technology 10 (1), 014008, 2021 | 18 | 2021 |
| Chemical Mechanical Polishing of Cobalt Films for Interconnect Applications R Popuri Clarkson University, 2017 | | 2017 |
| Bounds on the Cumulative Pore Size Distribution for Polycarbonate Track-etch Membranes Calculated Form Transport Measurements Using Moment Analysis: A Thesis R Popuri Clarkson University, 2013 | | 2013 |
