受强制性开放获取政策约束的文章 - James Huang了解详情
无法在其他位置公开访问的文章：3 篇
Selective Pulsed Chemical Vapor Deposition of Water-Free TiO2/Al2O3 and HfO2/Al2O3 Nanolaminates on Si and SiO2 in Preference to SiCOH
J Huang, Y Cho, Z Zhang, A Jan, KT Wong, SD Nemani, E Yieh, ...
ACS Applied Materials & Interfaces 14 (13), 15716-15727, 2022
强制性开放获取政策： US National Science Foundation
Low-k SiOx/AlOx Nanolaminate Dielectric on Dielectric Achieved by Hybrid Pulsed Chemical Vapor Deposition
J Huang, J Mu, Y Cho, C Winter, V Wang, Z Zhang, K Wang, C Kim, ...
ACS Applied Materials & Interfaces 15 (48), 56556-56566, 2023
强制性开放获取政策： US National Science Foundation
Dielectric-on-Dielectric Achieved on SiO2 in Preference to W by Water-free Chemical Vapor Depositions with Aniline Passivation
J Huang, Y Cho, V Wang, Z Zhang, J Mu, A Yadav, K Wong, S Nemani, ...
ACS Applied Materials & Interfaces 15 (21), 26128-26137, 2023
强制性开放获取政策： US National Science Foundation
可在其他位置公开访问的文章：6 篇
Cascaded enzyme reactions over a three-dimensional, wireframe DNA origami scaffold
JS Kahn, Y Xiong, J Huang, O Gang
Jacs Au 2 (2), 357-366, 2022
强制性开放获取政策： US National Science Foundation, US Department of Energy
Local environment affects the activity of enzymes on a 3D molecular scaffold
Y Xiong, J Huang, ST Wang, S Zafar, O Gang
ACS nano 14 (11), 14646-14654, 2020
强制性开放获取政策： US National Science Foundation, US Department of Energy
Inherent selective pulsed chemical vapor deposition of amorphous hafnium oxide/titanium oxide nanolaminates
Y Cho, J Huang, CF Ahles, Z Zhang, K Wong, S Nemani, E Yieh, ...
Applied Surface Science 600, 154010, 2022
强制性开放获取政策： US National Science Foundation
Inherently selective water-free deposition of titanium dioxide on the nanoscale: implications for nanoscale patterning
Y Cho, CF Ahles, JY Choi, J Huang, A Jan, K Wong, S Nemani, E Yieh, ...
ACS Applied Nano Materials 5 (1), 476-485, 2022
强制性开放获取政策： US National Science Foundation
Inherent selective pulsed chemical vapor deposition of aluminum oxide in nm scale
Y Cho, J Huang, Z Zhang, K Wang, P Lee, C Kim, K Wong, S Nemani, ...
Applied Surface Science 622, 156824, 2023
强制性开放获取政策： US National Science Foundation
Low-Resistivity Titanium Nitride Thin Films Fabricated by Atomic Layer Deposition with TiCl4 and Metal–Organic Precursors in Horizontal Vias
CH Kuo, AJ Mcleod, PC Lee, J Huang, H Kashyap, V Wang, SUK Yun, ...
ACS Applied Electronic Materials 5 (8), 4094-4102, 2023
强制性开放获取政策： US National Science Foundation, US Department of Defense
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