| Grating devices on a silicon nitride technology platform for visible light applications JH Song, TD Kongnyuy, B Troia, SS Saseendran, P Soussan, R Jansen, ... OSA Continuum 2 (4), 1155-1165, 2019 | 29 | 2019 |
| Study of nickel silicide formation and associated fill-factor loss analysis for silicon solar cells with plated Ni-Cu based metallization MC Raval, AP Joshi, SS Saseendran, S Suckow, S Saravanan, ... IEEE Journal of Photovoltaics 5 (6), 1554-1562, 2015 | 19 | 2015 |
| A 300mm CMOS-compatible PECVD silicon nitride platform for integrated photonics with low loss and low process induced phase variation SS Saseendran, TD Kongnyuy, B Figeys, F Buja, B Troia, S Kerman, ... 2019 Optical Fiber Communications Conference and Exhibition (OFC), 1-3, 2019 | 13 | 2019 |
| N2O plasma treatment for minimization of background plating in silicon solar cells with Ni–Cu front side metallization MC Raval, SS Saseendran, S Suckow, S Saravanan, CS Solanki, ... Solar Energy Materials and Solar Cells 144, 671-677, 2016 | 10 | 2016 |
| Optimization of ICP-CVD silicon nitride for Si solar cell passivation SS Sandeep, K Warikoo, A Kottantharayil 2012 38th IEEE Photovoltaic Specialists Conference, 001102-001104, 2012 | 10 | 2012 |
| Calibration-free Si-SiN optical phased array S Dwivedi, HK Tyagi, A Marinins, S Kerman, TD Kongnyuy, JØ Kjellman, ... Integrated Photonics Research, Silicon and Nanophotonics, IM4A. 3, 2019 | 9 | 2019 |
| Impact of post-deposition plasma treatment on surface passivation quality of silicon nitride films SS Saseendran, MC Raval, A Kottantharayil IEEE Journal of Photovoltaics 6 (1), 74-78, 2015 | 4 | 2015 |
| Plasma grown oxy-nitride films for silicon surface passivation SS Saseendran, A Kottantharayil IEEE electron device letters 34 (7), 918-920, 2013 | 4 | 2013 |
| Impact of interstitial oxygen trapped in silicon during plasma growth of silicon oxy-nitride films for silicon solar cell passivation SS Saseendran, S Saravanan, MC Raval, A Kottantharayil Journal of Applied Physics 119 (9), 2016 | 3 | 2016 |
| III-V-on-silicon nitride narrow-linewidth tunable laser based on micro-transfer printing B Pan, J Bourderionnet, V Billault, A Brignon, S Dwivedi, M Dahlem, ... 2023 Optical Fiber Communications Conference and Exhibition (OFC), 1-3, 2023 | 2 | 2023 |
| MoOx: A transparent phase change material for integrated photonics applications? SS Saseendran, TD Kongnyuy, B Figeys, KJ Sundar, JP Soulie, ... 2022 IEEE Photonics Conference (IPC), 1-2, 2022 | 2 | 2022 |
| Inverted pyramidal texturing of silicon through blisters in silicon nitride SS Saseendran, A Kottantharayil IEEE Journal of Photovoltaics 5 (3), 819-825, 2015 | 2 | 2015 |
| Thermal stability of single layer pulsed — DC reactive sputtered AlOXfilm and stack of ICP ℄ CVD SiNXon AlOXfor p-type c-Si surface passivation M Bhaisare, SS Sandeep, A Kottantharayil 2014 IEEE 2nd International Conference on Emerging Electronics (ICEE), 1-4, 2014 | 2 | 2014 |
| a-Si: H Layer Enabling a sub-1.2 dB Loss SiN-III/V-SiN Transition for Evanescently Coupled Lasers at 920 nm K Akritidis, M Billet, SS Saseendran, S Poelman, G Roelkens, P Neutens, ... 2023 IEEE Photonics Conference (IPC), 1-2, 2023 | 1 | 2023 |
| Material characterisation of LPCVD SiN and understanding loss behavior C Cummins, B Pan, G Roelkens, M Dahlem, SS Saseendran, P Helin The European Conference on Lasers and Electro-Optics, ce_p_16, 2023 | 1 | 2023 |
| Photolithography free inverted pyramidal texturing for solar cell applications SS Sandeep, A Kottantharayil 2014 IEEE 40th Photovoltaic Specialist Conference (PVSC), 1244-1247, 2014 | 1 | 2014 |
| Tunable heterogeneous III-V-on-silicon-nitride mode-locked laser M Billet, S Poelman, S Cuyvers, A Hermans, SS Saseendran, T Nakamura, ... Silicon Photonics XIX 12891, 64-66, 2024 | | 2024 |
| Micro-transfer printed III-V on silicon nitride narrow-linewidth laser with extended frequency chirp capability for distributed acoustic sensing measurements G Dandé, J Pennanech, B Pan, E Soltanian, J Zhang, B Kuyken, ... Smart Photonic and Optoelectronic Integrated Circuits 2024, PC128900J, 2024 | | 2024 |
| Engineering Ultrathin Si Membranes with sub-20 nm Pores at Wafer Scale C Cummins, SS Saseendran, A Humbert, L Shafeek, S Bagiante, ... | | 2023 |
| Method for Providing Different Patterns on a Single Substrate SS Saseendran, DS Tezcan, A Paneri, C Cummins US Patent App. 17/846,366, 2022 | | 2022 |
Anil KottantharayilIndian Institute of Technology Bombay在 iitb.ac.in 的电子邮件经过验证
