RF plasmas in methane: Prediction of plasma properties and neutral radical densities with combined gas-phase physics and chemistry model E Gogolides, D Mary, A Rhallabi, G Turban Japanese journal of applied physics 34 (1R), 261, 1995 | 107 | 1995 |
Surface and plasma simulation of deposition processes: CH4 plasmas for the growth of diamondlike carbon NV Mantzaris, E Gogolides, AG Boudouvis, A Rhallabi, G Turban Journal of applied physics 79 (7), 3718-3729, 1996 | 105 | 1996 |
Computer simulation of a carbon-deposition plasma in CH/sub 4 A Rhallabi, Y Catherine IEEE transactions on plasma science 19 (2), 270-277, 1991 | 105 | 1991 |
Monte Carlo simulation method for etching of deep trenches in Si by a plasma mixture G Marcos, A Rhallabi, P Ranson Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (1 …, 2003 | 70 | 2003 |
Global model and diagnostic of a low-pressure SF6/Ar inductively coupled plasma L Lallement, A Rhallabi, C Cardinaud, MC Peignon-Fernandez, LL Alves Plasma Sources Science and Technology 18 (2), 025001, 2009 | 59 | 2009 |
Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation MA Blauw, E van der Drift, G Marcos, A Rhallabi Journal of Applied Physics 94 (10), 6311-6318, 2003 | 56 | 2003 |
Radio-frequency glow discharges in methane gas: modelling of the gas-phase physics and chemistry E Gogolides, C Buteau, A Rhallabi, G Turban Journal of Physics D: Applied Physics 27 (4), 818, 1994 | 52 | 1994 |
Modeling of inductively coupled plasma SF6/O2/Ar plasma discharge: Effect of O2 on the plasma kinetic properties A Pateau, A Rhallabi, MC Fernandez, M Boufnichel, F Roqueta Journal of Vacuum Science & Technology A 32 (2), 2014 | 44 | 2014 |
Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication L Lallement, C Gosse, C Cardinaud, MC Peignon-Fernandez, A Rhallabi Journal of Vacuum Science & Technology A 28 (2), 277-286, 2010 | 44 | 2010 |
Topographic and kinetic effects of the rate during a cryogenic etching process of silicon G Marcos, A Rhallabi, P Ranson Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 25 | 2004 |
Modelling of fluorine based high density plasma for the etching of silica glasses L Lallement, A Rhallabi, C Cardinaud, MC Peignon Fernandez Journal of Vacuum Science & Technology A 29 (5), 2011 | 22 | 2011 |
Growth of nodular defects during film deposition L Dubost, A Rhallabi, J Perrin, J Schmitt Journal of applied physics 78 (6), 3784-3791, 1995 | 22 | 1995 |
Global Model ofHigh-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP R Chanson, A Rhallabi, MC Fernandez, C Cardinaud, S Bouchoule, ... IEEE Transactions on Plasma Science 40 (4), 959-971, 2012 | 20 | 2012 |
SF6 and C4F8 global kinetic models coupled to sheath models Y Haidar, A Pateau, A Rhallabi, MC Fernandez, A Mokrani, F Taher, ... Plasma Sources Science and Technology 23 (6), 065037, 2014 | 18 | 2014 |
Properties of deep etched trenches in silicon: Role of the angular dependence of the sputtering yield and the etched species redeposition G Marcos, A Rhallabi, P Ranson Applied surface science 254 (11), 3576-3584, 2008 | 15 | 2008 |
Estimation of surface kinetic parameters and two-dimensional simulation of InP pattern features during plasma etching A Rhallabi, L Houlet, G Turban Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4 …, 2000 | 15 | 2000 |
Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching M Avella, J Jiménez, F Pommereau, JP Landesman, A Rhallabi Applied Physics Letters 93 (13), 2008 | 14 | 2008 |
Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process G Le Dain, A Rhallabi, MC Fernandez, M Boufnichel, F Roqueta Journal of Vacuum Science & Technology A 35 (3), 2017 | 13 | 2017 |
Chemically assisted ion beam etching of GaAs by argon and chlorine gases: Experimental and simulation investigations A Rhallabi, M Gaillard, L Elmonser, G Marcos, A Talneau, F Pommereau, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 13 | 2005 |
Simulation of cryogenic silicon etching under SF6/O2/Ar plasma discharge Y Haidar, A Rhallabi, A Pateau, A Mokrani, F Taher, F Roqueta, ... Journal of Vacuum Science & Technology A 34 (6), 2016 | 12 | 2016 |