受强制性开放获取政策约束的文章 - Martijn FJ Vos了解详情
可在其他位置公开访问的文章：10 篇
Atomic layer deposition of molybdenum oxide from (NtBu) 2 (NMe2) 2Mo and O2 plasma
MFJ Vos, B Macco, NFW Thissen, AA Bol, WMM Kessels
Journal of Vacuum Science & Technology A 34 (1), 2016
强制性开放获取政策： Netherlands Organisation for Scientific Research
Area-selective deposition of ruthenium by combining atomic layer deposition and selective etching
MFJ Vos, SN Chopra, MA Verheijen, JG Ekerdt, S Agarwal, WMM Kessels, ...
Chemistry of Materials 31 (11), 3878-3882, 2019
强制性开放获取政策： US National Science Foundation, Netherlands Organisation for Scientific Research
Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
MFJ Vos, G van Straaten, WMME Kessels, AJM Mackus
The Journal of Physical Chemistry C 122 (39), 22519-22529, 2018
强制性开放获取政策： Netherlands Organisation for Scientific Research
Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
MFJ Vos, HCM Knoops, RA Synowicki, WMM Kessels, AJM Mackus
Applied Physics Letters 111 (11), 2017
强制性开放获取政策： Netherlands Organisation for Scientific Research
Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al (CH3) 3
NJ Chittock, MFJ Vos, T Faraz, WMM Kessels, H Knoops, AJM Mackus
Applied Physics Letters 117 (16), 2020
强制性开放获取政策： Netherlands Organisation for Scientific Research
Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design
MFJ Vos, SN Chopra, JG Ekerdt, S Agarwal, WMM Kessels, AJM Mackus
Journal of Vacuum Science & Technology A 39 (3), 2021
强制性开放获取政策： US National Science Foundation, Netherlands Organisation for Scientific Research
Plasma-enhanced atomic layer deposition of cobalt and cobalt nitride: what controls the incorporation of nitrogen?
G van Straaten, R Deckers, MFJ Vos, WMM Kessels, M Creatore
The Journal of Physical Chemistry C 124 (40), 22046-22054, 2020
强制性开放获取政策： Netherlands Organisation for Scientific Research
Atomic layer deposition of ruthenium using an ABC-type process: Role of oxygen exposure during nucleation
SN Chopra, MFJ Vos, MA Verheijen, JG Ekerdt, WMM Kessels, ...
Journal of Vacuum Science & Technology A 38 (6), 2020
强制性开放获取政策： US National Science Foundation, Netherlands Organisation for Scientific Research
Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
MFJ Vos, HCM Knoops, WMM Kessels, AJM Mackus
The Journal of Physical Chemistry C 125 (7), 3913-3923, 2021
强制性开放获取政策： Netherlands Organisation for Scientific Research
Influence of magnetic configuration on edge turbulence and transport in the H-1 Heliac
CA Michael, F Zhao, B Blackwell, MFJ Vos, J Brotankova, SR Haskey, ...
Plasma Physics and Controlled Fusion 59 (2), 024001, 2016
强制性开放获取政策： Australian Research Council
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