Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM S Park, Y Jang, T Cha, Y Noh, Y Choi, J Lee, J Seong, B Kim, T Cho, ... Physics of Plasmas 27 (8), 2020 | 14 | 2020 |
Plasma information-based virtual metrology (PI-VM) and mass production process control S Park, J Seong, Y Jang, HJ Roh, JW Kwon, J Lee, S Ryu, J Song, ... Journal of the Korean Physical Society 80 (8), 647-669, 2022 | 11 | 2022 |
Micro-range uniformity control of the etching profile in the OLED display mass production referring to the PI-VM model S Park, J Seong, Y Noh, Y Park, Y Jang, T Cho, JH Yang, GH Kim Physics of Plasmas 28 (10), 2021 | 6 | 2021 |
Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM S Park, J Seong, Y Park, Y Noh, H Lee, N Bae, KB Roh, R Seo, B Song, ... Plasma Physics and Controlled Fusion 66 (2), 025014, 2024 | 1 | 2024 |
Data-driven plasma science-based plasma etching process design in OLED and Semiconductor mass productions referring to PI-VM S Park, J Seong, Y Park, H Lee, N Bae, GH Kim Bulletin of the American Physical Society, 2024 | | 2024 |
Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production S Park, Y Park, J Seong, H Lee, N Bae, K Roh, R Seo, B Song, GH Kim Physics of Plasmas 31 (7), 2024 | | 2024 |