Scalable CMOS back-end-of-line-compatible AlScN/two-dimensional channel ferroelectric field-effect transistors KH Kim, S Oh, MMA Fiagbenu, J Zheng, P Musavigharavi, P Kumar, ... Nature nanotechnology 18 (9), 1044-1050, 2023 | 73 | 2023 |
Large area few-layer TMD film growths and their applications SV Mandyam, HM Kim, M Drndić Journal of Physics: Materials 3 (2), 024008, 2020 | 41 | 2020 |
High-density, localized quantum emitters in strained 2D semiconductors G Kim, HM Kim, P Kumar, M Rahaman, CE Stevens, J Jeon, K Jo, KH Kim, ... ACS nano 16 (6), 9651-9659, 2022 | 33 | 2022 |
The not-so-rare earth elements HM Kim, D Jariwala | 3 | 2021 |
Scalable CMOS-BEOL compatible AlScN/2D Channel FE-FETs KH Kim, S Oh, MMA Fiagbenu, J Zheng, P Musavigharavi, P Kumar, ... arXiv preprint arXiv:2201.02153, 2022 | 1 | 2022 |