| Predictive control of quality in batch polymerization using hybrid ANN models AYD Tsen, SS Jang, DSH Wong, B Joseph AIChE Journal 42 (2), 455-465, 1996 | 174 | 1996 |
| System and method for implementing a virtual metrology advanced process control platform PF Tsai, A Tsen, JN Sung US Patent US-8437870-B2, 2013 | 40 | 2013 |
| Method and system for tuning advanced process control parameters A Tsen, CW Hsu, MY Hung, MY Fan, JF Wang, JI Mou US Patent US-8229588-B2, 2012 | 26 | 2012 |
| System and method for implementing a wafer acceptance test (“WAT”) advanced process control (“APC”) with novel sampling policy and architecture A Tsen, JF Wang, PF Tsai, MY Fan, J Wang, JI Mou, S Wu US Patent 8,108,060, 2012 | 16 | 2012 |
| Advanced process control with novel sampling policy WJ Fei, A Tsen, MY Fan, J Wang, JI Mou US Patent US-8392009-B2, 2013 | 14 | 2013 |
| Method for bin-based control S Wu, CS Shih, A Tsen, JF Wang, JI Mou, H Kuan US Patent US-8041451-B2, 2011 | 11 | 2011 |
| Method for a bin ratio forecast at new tape out stage CH Lin, A Tsen, JL Chen, S Wu, JI Mou, CH Huang US Patent US-8082055-B2, 2011 | 10 | 2011 |
| System and method for implementing multi-resolution advanced process control A Tsen, JN Sung, PF Tsai, JI Mou, YW Cheng US Patent US-8394719-B2, 2013 | 6 | 2013 |
| Method and apparatus for advanced process control PF Tsai, A Tsen US Patent US-8224475-B2, 2012 | 6 | 2012 |
| Advanced process control for new tapeout product CW Hsu, YJ Cheng, WP Liu, SP Wang, SR Lu, JF Wang, JI Mou, A Tsen, ... US Patent US-8239056-B2, 2012 | 5 | 2012 |
| Method and system for implementing virtual metrology in semiconductor fabrication PF Tsai, A Tsen, JF Wang, JI Mou US Patent US-8396583-B2, 2013 | 4 | 2013 |
| System and method for implementing multi-resolution advanced process control A Tsen, JN Sung, JIM Po-Feng Tsai US Patent US-7951615-B2, 2011 | 4 | 2011 |
| Y.-D., Jang, SS, Wong, DSH and Joseph, B.,“Predictive Control of Quality in Batch Polymerization Using Hybrid ANN Models” A Tsen AIChE J 42, 455-465, 1996 | 4 | 1996 |
| A novel multiple resolution APC on CMP and Litho-Etching A Tsen, YW Cheng, YP Hsieh 2013 e-Manufacturing & Design Collaboration Symposium (eMDC), 1-2, 2013 | 1 | 2013 |
| System and method for implementing wafer acceptance test ("WAT") advanced process control ("APC") with routing model A Tsen, S Wu, WJ Fei, Jong-I Mou US Patent US-8219341-B2, 2012 | 1 | 2012 |
| Reinforcement Learning Chemical-mechanical Polishing Run-to-Run Controller A Yen-Di Tsen, TL Chen 2023 IEEE 5th Eurasia Conference on IOT, Communication and Engineering …, 2023 | | 2023 |
| INTRA-FIELD PROCESS CONTROL FOR LITHOGRAPHY AJ Hung, CY Huang, SR Lu, A Tsen TW Patent I711,888, 2020 | | 2020 |
| METHOD AND/OR SYSTEM FOR CHEMICAL MECHANICAL PLANARIZATION (CMP) A Tsen, YW Cheng, JI Mou TW Patent I633,969, 2018 | | 2018 |
| CALIBRATION APPARATUS AND ADJUSTMENT METHOD FOR ADJUSTING ILLUMINATION DEVICE OF LITHOGRAPHY APPARATUS CY Huang, AJ Hung, SR Lu, A Tsen TW Patent I582,547, 2017 | | 2017 |
| EXPOSING CORRECTION METHOD AND CONTROL APPARATUS A Tsen, SR Lu, JI Mou TW Patent I521,313, 2016 | | 2016 |
Babu JosephProfessor of Chemical Engineering, University of South Florida在 usf.edu 的电子邮件经过验证
