Effect of humidity on friction and wear—A critical review Z Chen, X He, C Xiao, SH Kim Lubricants 6 (3), 74, 2018 | 133 | 2018 |
Force-induced Transition of π–π Stacking in a Single Polystyrene Chain W Cai, D Xu, L Qian, J Wei, C Xiao, L Qian, Z Lu, S Cui Journal of the American Chemical Society 141 (24), 9500-9503, 2019 | 74 | 2019 |
Thickness and structure of adsorbed water layer and effects on adhesion and friction at nanoasperity contact C Xiao, P Shi, W Yan, L Chen, L Qian, SH Kim Colloids and Interfaces 3 (3), 55, 2019 | 73 | 2019 |
Interplay between counter-surface chemistry and mechanical activation in mechanochemical removal of N-faced GaN surface in humid ambient J Guo, C Xiao, J Gao, G Li, H Wu, L Chen, L Qian Tribology International 159, 107004, 2021 | 55 | 2021 |
Mechanochemical reactions of GaN-Al2O3 interface at the nanoasperity contact: Roles of crystallographic polarity and ambient humidity J Guo, J Gao, C Xiao, L Chen, L Qian Friction 10 (7), 1005-1018, 2022 | 54 | 2022 |
Origin of low friction in hydrogenated diamond-like carbon films due to graphene nanoscroll formation depending on sliding mode: Unidirection and reciprocation Y Liu, L Chen, B Jiang, Y Liu, B Zhang, C Xiao, J Zhang, L Qian Carbon 173, 696-704, 2021 | 54 | 2021 |
Effect of crystal plane orientation on tribochemical removal of monocrystalline silicon C Xiao, J Guo, P Zhang, C Chen, L Chen, L Qian Scientific reports 7 (1), 40750, 2017 | 49 | 2017 |
Detecting van der Waals forces between a single polymer repeating unit and a solid surface in high vacuum W Cai, C Xiao, L Qian, S Cui Nano Research 12, 57-61, 2019 | 47 | 2019 |
Polishing of polycrystalline diamond using synergies between chemical and mechanical inputs: A review of mechanisms and processes C Xiao, FC Hsia, A Sutton-Cook, B Weber, S Franklin Carbon 196, 29-48, 2022 | 45 | 2022 |
Friction and tribochemical wear behaviors of native oxide layer on silicon at nanoscale L Chen, C Xiao, X He, B Yu, SH Kim, L Qian Tribology Letters 65, 1-8, 2017 | 38 | 2017 |
What governs friction of silicon oxide in humid environment: contact area between solids, water meniscus around the contact, or water layer structure? L Chen, C Xiao, B Yu, SH Kim, L Qian Langmuir 33 (38), 9673-9679, 2017 | 37 | 2017 |
Role of water in the tribochemical removal of bare silicon C Chen, C Xiao, X Wang, P Zhang, L Chen, Y Qi, L Qian Applied Surface Science 390, 696-702, 2016 | 36 | 2016 |
Surface structure dependence of mechanochemical etching: Scanning probe-based nanolithography study on Si (100), Si (110), and Si (111) C Xiao, X Xin, X He, H Wang, L Chen, SH Kim, L Qian ACS applied materials & interfaces 11 (23), 20583-20588, 2019 | 35 | 2019 |
Effect of abrasive particle size on tribochemical wear of monocrystalline silicon P Zhang, H He, C Chen, C Xiao, L Chen, L Qian Tribology International 109, 222-228, 2017 | 34 | 2017 |
Temperature-dependent mechanochemical wear of silicon in water: The role of Si–OH surfacial groups Z Liu, J Gong, C Xiao, P Shi, SH Kim, L Chen, L Qian Langmuir 35 (24), 7735-7743, 2019 | 31 | 2019 |
Threshold contact pressure for the material removal on monocrystalline silicon by SiO2 microsphere C Xiao, C Chen, J Guo, P Zhang, L Chen, L Qian Wear 376, 188-193, 2017 | 31 | 2017 |
Investigation of silicon wear against non-porous and micro-porous SiO 2 spheres in water and in humid air Y Qi, L Chen, S Jiang, J Yu, B Yu, C Xiao, L Qian RSC advances 6 (92), 89627-89634, 2016 | 28 | 2016 |
Interplay between solution chemistry and mechanical activation in friction-induced material removal of silicon surface in aqueous solution C Xiao, C Deng, P Zhang, L Qian, SH Kim Tribology International 148, 106319, 2020 | 26 | 2020 |
Dependence of water adsorption on the surface structure of silicon wafers aged under different environmental conditions L Chen, D Ngo, J Luo, Y Gong, C Xiao, X He, B Yu, L Qian, SH Kim Physical Chemistry Chemical Physics 21 (47), 26041-26048, 2019 | 26 | 2019 |
An experimental investigation of silicon wafer thinning by sequentially using constant-pressure diamond grinding and fixed-abrasive chemical mechanical polishing G Li, C Xiao, S Zhang, R Sun, Y Wu Journal of Materials Processing Technology 301, 117453, 2022 | 25 | 2022 |