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Filip Gucmann
Filip Gucmann
Institute of Electrical Engineering, Slovak Academy of Sciences, Bratislava, Slovakia
在 savba.sk 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
Annealing effect of surface-activated bonded diamond/Si interface
J Liang, Y Zhou, S Masuya, F Gucmann, M Singh, J Pomeroy, S Kim, ...
Diamond and Related Materials 93, 187-192, 2019
402019
Low-temperature atomic layer deposition-grown Al2O3 gate dielectric for GaN/AlGaN/GaN MOS HEMTs: Impact of deposition conditions on interface state density
M Ťapajna, L Válik, F Gucmann, D Gregušová, K Fröhlich, Š Haščík, ...
Journal of Vacuum Science & Technology B 35 (1), 2017
312017
Investigation of ‘surface donors’ in Al2O3/AlGaN/GaN metal-oxide-semiconductor heterostructures: Correlation of electrical, structural, and chemical properties
M Ťapajna, R Stoklas, D Gregušová, F Gucmann, K Hušeková, Š Haščík, ...
Applied Surface Science 426, 656-661, 2017
292017
Scanning thermal microscopy for accurate nanoscale device thermography
F Gucmann, JW Pomeroy, M Kuball
Nano Today 39, 101206, 2021
202021
Growth of α-and β-Ga2O3 epitaxial layers on sapphire substrates using liquid-injection MOCVD
F Egyenes-Pörsök, F Gucmann, K Hušeková, E Dobročka, M Sobota, ...
Semiconductor Science and Technology 35 (11), 115002, 2020
202020
Heteroepitaxial growth of Ga2O3 on 4H-SiC by liquid-injection MOCVD for improved thermal management of Ga2O3 power devices
F Hrubišák, K Hušeková, X Zheng, A Rosová, E Dobročka, M Ťapajna, ...
Journal of Vacuum Science & Technology A 41 (4), 2023
152023
InGaAs/GaAs metal-oxide-semiconductor heterostructure field-effect transistors with oxygen-plasma oxide and Al2O3 double-layer insulator
F Gucmann, D Gregušová, R Stoklas, J Dérer, R Kúdela, K Fröhlich, ...
Applied Physics Letters 105 (18), 2014
142014
Structure and Thermal Stability of ε/κ-Ga2O3 Films Deposited by Liquid-Injection MOCVD
E Dobročka, F Gucmann, K Hušeková, P Nádaždy, F Hrubišák, F Egyenes, ...
Materials 16 (1), 20, 2022
122022
Evidence of relationship between strain and In-incorporation: Growth of N-polar In-rich InAlN buffer layer by OMCVD
P Chauhan, S Hasenöhrl, E Dobročka, MP Chauvat, A Minj, F Gucmann, ...
Journal of Applied Physics 125 (10), 2019
122019
Extraction and characterization of polysaccharide films prepared from Furcellaria lumbricalis and Gigartina skottsbergii seaweeds
I Šimkovic, F Gucmann, R Mendichi, AG Schieroni, D Piovani, E Dobročka, ...
Cellulose 28 (15), 9567-9588, 2021
112021
Properties of InGaAs/GaAs metal-oxide-semiconductor heterostructure field-effect transistors modified by surface treatment
D Gregušová, F Gucmann, R Kúdela, M Mičušík, R Stoklas, L Valik, ...
Applied Surface Science 395, 140-144, 2017
112017
High efficiency aln/gan hemts for q-band applications with an improved thermal dissipation
R Kabouche, R Pecheux, K Harrouche, E Okada, F Medjdoub, J Derluyn, ...
International Journal of High Speed Electronics and Systems 28 (01n02), 1940003, 2019
92019
Semi-insulating GaN for vertical structures: role of substrate selection and growth pressure
P Šichman, S Hasenöhrl, R Stoklas, J Priesol, E Dobročka, Š Haščík, ...
Materials Science in Semiconductor Processing 118, 105203, 2020
82020
Thermal analysis of semiconductor devices and materials-Why should I not trust a thermal simulation?
M Kuball, JW Pomeroy, F Gucmann, B Oner
2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and …, 2019
82019
Scaling of the physical properties in Ba (Fe, Ni) _ {2} As_ {2} single crystals: Evidence for quantum fluctuations
P. Rodière, T. Klein, L. Lemberger, K. Hasselbach, A. Demuer, J. Kačmarčik ...
Phys. Rev. B 85 (21), 214506, 2012
82012
Doping efficiency and electron transport in Al-doped ZnO films grown by atomic layer deposition
A Mošková, M Moško, M Precner, M Mikolášek, A Rosová, M Mičušík, ...
Journal of Applied Physics 130 (3), 2021
72021
Growth and properties of N‐polar InN/InAlN heterostructures
S Hasenöhrl, E Dobročka, R Stoklas, F Gucmann, A Rosová, J Kuzmík
physica status solidi (a) 217 (19), 2000197, 2020
72020
Thermal stability of rhombohedral α-and monoclinic β-Ga2O3 grown on sapphire by liquid-injection MOCVD
F Gucmann, P Nádaždy, K Hušeková, E Dobročka, J Priesol, F Egyenes, ...
Materials Science in Semiconductor Processing 156, 107289, 2023
62023
Impact of oxide/barrier charge on threshold voltage instabilities in AlGaN/GaN metal-oxide-semiconductor heterostructures
M Ťapajna, J Drobný, F Gucmann, K Hušeková, D Gregušová, ...
Materials Science in Semiconductor Processing 91, 356-361, 2019
62019
Distribution of fixed oxide charge in MOS structures with ALD grown Al2O3studied by capacitance measurements
L Valik, M Ťapajna, F Gucmann, J Fedor, P Šiffalovič, K Fröhlich
The Ninth International Conference on Advanced Semiconductor Devices and …, 2012
62012
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