Freestanding CVD diamond elaborated by pulsed-microwave-plasma for ZnO/diamond SAW devices T Lamara, M Belmahi, O Elmazria, L Le Brizoual, J Bougdira, M Remy, ... Diamond and related materials 13 (4-8), 581-584, 2004 | 79 | 2004 |
Thermal and optical properties of CdS nanoparticles in thermotropic liquid crystal monomers HL Lee, IA Mohammed, M Belmahi, MB Assouar, H Rinnert, M Alnot Materials 3 (3), 2069-2086, 2010 | 49 | 2010 |
Synthesis and characterizations of bare CdS nanocrystals using chemical precipitation method for photoluminescence application HL Lee, AM Issam, M Belmahi, MB Assouar, H Rinnert, M Alnot Journal of Nanomaterials 2009 (1), 914501, 2009 | 46 | 2009 |
The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N2/Ar/hexamethyldisilazane microwave plasma S Bulou, L Le Brizoual, P Miska, L de Poucques, R Hugon, M Belmahi, ... Thin Solid Films 520 (1), 245-250, 2011 | 45 | 2011 |
Growth and characterisation of carbon nanostructures obtained by MPACVD system using CH4/CO2 gas mixture H Chatei, M Belmahi, MB Assouar, L Le Brizoual, P Bourson, J Bougdira Diamond and related materials 15 (4-8), 1041-1046, 2006 | 39 | 2006 |
SAW devices based on ZnO inclined c-axis on diamond S Bensmaine, L Le Brizoual, O Elmazria, JJ Fundenberger, M Belmahi, ... Diamond and related materials 17 (7-10), 1420-1423, 2008 | 38 | 2008 |
MPACVD diamond films for surface acoustic wave filters MB Assouar, F Bénédic, O Elmazria, M Belmahi, RJ Riobóo, P Alnot Diamond and related materials 10 (3-7), 681-685, 2001 | 35 | 2001 |
Wide variations of SiCxNy: H thin films optical constants deposited by H2/N2/Ar/hexamethyldisilazane microwave plasma S Bulou, L Le Brizoual, P Miska, L de Poucques, J Bougdira, M Belmahi Surface and Coatings Technology 208, 46-50, 2012 | 32 | 2012 |
Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N2/Ar mixture S Bulou, L Le Brizoual, P Miska, L De Poucques, R Hugon, M Belmahi, ... Surface and Coatings Technology 205, S214-S217, 2011 | 29 | 2011 |
Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering A Bachar, A Bousquet, H Mehdi, G Monier, C Robert-Goumet, L Thomas, ... Applied Surface Science 444, 293-302, 2018 | 24 | 2018 |
Cadmium sulfide thin films growth by chemical bath deposition S Hariech, MS Aida, J Bougdira, M Belmahi, G Medjahdi, D Genève, ... Journal of Semiconductors 39 (3), 034004, 2018 | 23 | 2018 |
Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture M Belmahi, S Bulou, A Thouvenin, L De Poucques, R Hugon, ... Plasma Processes and Polymers 11 (6), 551-558, 2014 | 21 | 2014 |
Diamond thin film growth by pulsed microwave plasma at high power density in a CH4–H2 gas mixture T Lamara, M Belmahi, J Bougdira, F Bénédic, G Henrion, M Rémy Surface and Coatings Technology 174, 784-789, 2003 | 21 | 2003 |
Investigations on nitrogen addition in the CH4–H2 gas mixture used for diamond deposition for a better understanding and the optimisation of the synthesis process F Benedic, M Belmahi, O Elmazria, MB Assouar, JJ Fundenberger, ... Surface and Coatings Technology 176 (1), 37-49, 2003 | 20 | 2003 |
Plasma synthesis of hexagonal-pyramidal graphite hillocks X Glad, L De Poucques, JA Jaszczak, M Belmahi, J Ghanbaja, J Bougdira Carbon 76, 330-340, 2014 | 16 | 2014 |
In situ optical characterization during MPACVD diamond film growth on silicon substrates using a bichromatic infrared pyrometer under oblique incidence F Bénédic, M Belmahi, T Easwarakhanthan, P Alnot Journal of Physics D: Applied Physics 34 (7), 1048, 2001 | 16 | 2001 |
Characterization of a N2/CH4 Microwave Plasma With a Solid Additive Si Source Used for SiCN Deposition S Bulou, L Le Brizoual, R Hugon, L De Poucques, M Belmahi, HN Migeon, ... Plasma processes and polymers 6 (S1), S576-S581, 2009 | 15 | 2009 |
a-SiCxNy thin films deposited by a microwave plasma assisted CVD process using a CH4/N2/Ar/HMDSN mixture: methane rate effect S Bulou, L Le Brizoual, P Miska, L De Poucques, R Hugon, M Belmahi IOP Conference Series: Materials Science and Engineering 12 (1), 012002, 2010 | 13 | 2010 |
Role of silicon on the growth mechanisms of CNx and SiCN thin films by N2/CH4 microwave plasma assisted chemical vapour deposition P Kouakou, M Belmahi, V Brien, V Hody, HN Migeon, J Bougdira Surface and Coatings Technology 203 (3-4), 277-283, 2008 | 13 | 2008 |
Preliminary Synthesis of Carbon Nitride Thin Films by N2/CH4 Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and … P Kouakou, V Brien, B Assouar, V Hody, M Belmahi, HN Migeon, ... Plasma Processes and Polymers 4 (S1), S210-S214, 2007 | 13 | 2007 |