| CVD diamond films: from growth to applications A Gicquel, K Hassouni, F Silva, J Achard Current Applied Physics 1 (6), 479-496, 2001 | 277 | 2001 |
| High quality MPACVD diamond single crystal growth: high microwave power density regime J Achard, F Silva, A Tallaire, X Bonnin, G Lombardi, K Hassouni, ... Journal of Physics D: Applied Physics 40 (20), 6175, 2007 | 212 | 2007 |
| Microwave engineering of plasma-assisted CVD reactors for diamond deposition F Silva, K Hassouni, X Bonnin, A Gicquel Journal of physics: condensed matter 21 (36), 364202, 2009 | 197 | 2009 |
| Self-consistent microwave field and plasma discharge simulations for a moderate pressure hydrogen discharge reactor K Hassouni, TA Grotjohn, A Gicquel Journal of Applied Physics 86 (1), 134-151, 1999 | 177 | 1999 |
| Modelling of diamond deposition microwave cavity generated plasmas K Hassouni, F Silva, A Gicquel Journal of physics D: Applied physics 43 (15), 153001, 2010 | 162 | 2010 |
| High quality, large surface area, homoepitaxial MPACVD diamond growth F Silva, J Achard, O Brinza, X Bonnin, K Hassouni, A Anthonis, K De Corte, ... Diamond and Related Materials 18 (5-8), 683-697, 2009 | 147 | 2009 |
| Plasma–wall interaction studies within the EUROfusion consortium: progress on plasma-facing components development and qualification S Brezinsek, JW Coenen, T Schwarz-Selinger, K Schmid, A Kirschner, ... Nuclear fusion 57 (11), 116041, 2017 | 132 | 2017 |
| Chemical kinetics and energy transfer in moderate pressure H2 plasmas used in diamond MPACVD processes K Hassouni, A Gicquel, M Capitelli, J Loureiro Plasma Sources Science and Technology 8 (3), 494, 1999 | 126 | 1999 |
| Hydrogen storage by adsorption on activated carbon: investigation of the thermal effects during the charging process G Hermosilla-Lara, G Momen, PH Marty, B Le Neindre, K Hassouni International journal of hydrogen energy 32 (10-11), 1542-1553, 2007 | 120 | 2007 |
| Non-equilibrium plasma kinetics: a state-to-state approach M Capitelli, I Armenise, D Bruno, M Cacciatore, R Celiberto, G Colonna, ... Plasma Sources Science and Technology 16 (1), S30, 2007 | 120 | 2007 |
| Interaction between soot particles and during dielectric barrier discharge plasma remediation of simulated diesel exhaust R Dorai, K Hassouni, MJ Kushner Journal of applied physics 88 (10), 6060-6071, 2000 | 107 | 2000 |
| Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition G Lombardi, K Hassouni, GD Stancu, L Mechold, J Röpcke, A Gicquel Journal of Applied Physics 98 (5), 2005 | 103 | 2005 |
| Vibrational kinetics, electron dynamics and elementary processes in H2 and D2 plasmas for negative ion production: modelling aspects M Capitelli, M Cacciatore, R Celiberto, O De Pascale, P Diomede, ... Nuclear fusion 46 (6), S260, 2006 | 102 | 2006 |
| Determining electron temperature and density in a hydrogen microwave plasma CD Scott, S Farhat, A Gicquel, K Hassouni, M Lefebvre Journal of thermophysics and heat transfer 10 (3), 426-435, 1996 | 84 | 1996 |
| Nucleation, growth and characterization of nanocrystalline diamond films G Cicala, P Bruno, F Bénédic, F Silva, K Hassouni, GS Senesi Diamond and Related Materials 14 (3-7), 421-425, 2005 | 82 | 2005 |
| Numerical modeling of capacitively coupled hydrogen plasmas: Effects of frequency and pressure T Novikova, B Kalache, P Bulkin, K Hassouni, W Morscheidt, ... Journal of Applied Physics 93 (6), 3198-3206, 2003 | 79 | 2003 |
| Elaboration of pure and doped TiO2 nanoparticles in sol–gel reactor with turbulent micromixing: Application to nanocoatings and photocatalysis R Azouani, A Michau, K Hassouni, K Chhor, JF Bocquet, JL Vignes, ... Chemical engineering research and design 88 (9), 1123-1130, 2010 | 73 | 2010 |
| Determination of gas temperature and C2 absolute density in Ar/H2/CH4 microwave discharges used for nanocrystalline diamond deposition from the C2 Mulliken system G Lombardi, F Bénédic, F Mohasseb, K Hassouni, A Gicquel Plasma Sources Science and Technology 13 (3), 375, 2004 | 71 | 2004 |
| The role of dissociative attachment from Rydberg states in enhancing H− concentration in moderate-and low-pressure H2 plasma sources K Hassouni, A Gicquel, M Capitelli Chemical physics letters 290 (4-6), 502-508, 1998 | 71 | 1998 |
| QDB: a new database of plasma chemistries and reactions J Tennyson, S Rahimi, C Hill, L Tse, A Vibhakar, D Akello-Egwel, ... Plasma Sources Science and Technology 26 (5), 055014, 2017 | 69 | 2017 |
Guillaume LombardiCNRS LSPM - University Sorbonne Paris Nord在 lspm.cnrs.fr 的电子邮件经过验证
