Surface reaction mechanisms during ozone and oxygen plasma assisted atomic layer deposition of aluminum oxide VR Rai, V Vandalon, S Agarwal Langmuir 26 (17), 13732-13735, 2010 | 115 | 2010 |
Surface reaction mechanisms during plasma-assisted atomic layer deposition of titanium dioxide VR Rai, S Agarwal The Journal of Physical Chemistry C 113 (30), 12962-12965, 2009 | 78 | 2009 |
Influence of surface temperature on the mechanism of atomic layer deposition of aluminum oxide using an oxygen plasma and ozone VR Rai, V Vandalon, S Agarwal Langmuir 28 (1), 350-357, 2012 | 72 | 2012 |
Surface reaction mechanisms during ozone-based atomic layer deposition of titanium dioxide VR Rai, S Agarwal The Journal of Physical Chemistry C 112 (26), 9552-9554, 2008 | 71 | 2008 |
Mechanism of self-catalytic atomic layer deposition of silicon dioxide using 3-aminopropyl triethoxysilane, water, and ozone VR Rai, S Agarwal Chemistry of Materials 23 (9), 2312-2316, 2011 | 56 | 2011 |
In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition VR Rai, S Agarwal Journal of Vacuum Science & Technology A 30 (1), 2012 | 39 | 2012 |
Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy RP Chaukulkar, NFW Thissen, VR Rai, S Agarwal Journal of Vacuum Science & Technology A 32 (1), 2014 | 20 | 2014 |
Study of surface reactions during atomic layer deposition using in situ infrared spectroscopy RP Chaukulkar, N Thissen, VR Rai, S Agarwal Abstracts of Papers of the American Chemical Society 242, 2011 | 1 | 2011 |
Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Isopropoxide and Ozone V Rai, S Agarwal ECS Meeting Abstracts, 775, 2008 | 1 | 2008 |
Investigation of gas-surface interactions during atomic layer deposition VR Rai 2011-Mines Theses & Dissertations, 2011 | | 2011 |
Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetraisopropoxide and Ozone S Agarwal, VR Rai The 2008 Annual Meeting, 2008 | | 2008 |
LOW TEMPERATURE HYDROGEN PLASMA-ASSISTED ATOMIC LAYER DEPOSITION OF COPPER STUDIED USING IN SITU INFRARED REFLECTION ABSORPTION SPECTROSCOPY RPCNFW Thissen, VR Rai, S Agarwal ENGINEERING THE SURFACES OF GROUP IV MATERIALS FOR ENERGY APPLICATIONS 1001, 117, 0 | | |