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Aurélien Sarrazin
Aurélien Sarrazin
CEA-Leti
在 cea.fr 的电子邮件经过验证
标题
引用次数
引用次数
年份
DSA planarization approach to solve pattern density issue
PP Barros, A Gharbi, A Sarrazin, R Tiron, N Posseme, S Barnola, S Bos, ...
Advanced Etch Technology for Nanopatterning IV 9428, 47-56, 2015
192015
Optical properties of Au colloids self-organized into rings via copolymer templates
SS Lamarre, A Sarrazin, J Proust, H Yockell-Lelièvre, J Plain, AM Ritcey, ...
Journal of nanoparticle research 15, 1-6, 2013
192013
Surface affinity role in graphoepitaxy of lamellar block copolymers
G Claveau, P Quemere, M Argoud, J Hazart, PP Barros, A Sarrazin, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 031604-031604, 2016
182016
PMMA removal selectivity to polystyrene using dry etch approach
A Sarrazin, N Posseme, P Pimenta-Barros, S Barnola, A Gharbi, ...
Journal of Vacuum Science & Technology B 34 (6), 2016
152016
Single step synthesis and organization of gold colloids assisted by copolymer templates
A Sarrazin, A Gontier, A Plaud, J Béal, H Yockell-Lelièvre, JL Bijeon, ...
Nanotechnology 25 (22), 225603, 2014
152014
A new FDSOI spin qubit platform with 40nm effective control pitch
T Bédécarrats, BC Paz, BM Diaz, H Niebojewski, B Bertrand, N Rambal, ...
2021 IEEE International Electron Devices Meeting (IEDM), 1-4, 2021
122021
Copolymer template control of gold nanoparticle synthesis via thermal annealing
A Plaud, A Sarrazin, J Béal, J Proust, P Royer, JL Bijeon, J Plain, ...
Journal of nanoparticle research 15, 1-6, 2013
122013
New CH4-N2 dry etch chemistry for poly (methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application
A Sarrazin, N Posseme, P Pimenta-Barros, S Barnola, R Tiron, ...
Journal of Vacuum Science & Technology B 37 (3), 2019
72019
Strategies for self-organization of Au nanoparticles assisted by copolymer templates
T Maurer, A Sarrazin, A Plaud, J Béal, R Nicolas, SS Lamarre, J Proust, ...
Plasmonics: Metallic Nanostructures and Their Optical Properties XI 8809 …, 2013
72013
Block copolymer selectivity: A new dry etch approach for cylindrical applications
A Sarrazin, N Posseme, P Pimenta-Barros, S Barnola, A Gharbi, ...
Journal of Vacuum Science & Technology B 36 (4), 2018
62018
3D sequential integration: applications and associated key enabling modules (design & technology)
P Batude, O Billoint, S Thuries, P Malinge, C Fenouillet-Beranger, ...
2021 IEEE International Electron Devices Meeting (IEDM), 3.2. 1-3.2. 4, 2021
32021
Method for selective etching of a block copolymer
N Posseme, A Sarrazin
US Patent App. 15/759,123, 2018
32018
Développement de techniques de patterning avancées pour les filières CMOS-sub 10nm
A Sarrazin
Nantes, 2017
32017
PMMA removal selectivity to PS using dry etch approach: sub-10nm patterning application
A Sarrazin, N Posseme, PP Barros, S Barnola, G Claveau, A Gharbi, ...
Advanced Etch Technology for Nanopatterning V 9782, 9-19, 2016
32016
Process highlights to enhance DSA contact patterning performances
A Gharbi, R Tiron, M Argoud, G Chamiot-Maitral, A Fouquet, C Lapeyre, ...
Alternative Lithographic Technologies VIII 9777, 159-167, 2016
32016
3D sequential integration with Si CMOS stacked on 28nm industrial FDSOI with Cu-ULK iBEOL featuring RO and HDR pixel
T Mota-Frutuoso, V Lapras, L Brunet, L Basset, J Lugo, ...
2023 International Electron Devices Meeting (IEDM), 1-4, 2023
12023
Tunnel and capacitive coupling optimization in FDSOI spin-qubit devices
B Bertrand, B Martinez, J Li, BC Paz, V Millory, V Labracherie, L Brevard, ...
2023 International Electron Devices Meeting (IEDM), 1-4, 2023
12023
Chitosan as a water-based photoresist for DUV lithography
I Servin, A Teolis, A Bazin, A Sarrazin, P Durin, O Sysova, C Gablin, ...
Advances in Patterning Materials and Processes XL 12498, 227-238, 2023
12023
Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges
S Landis, H Teyssedre, G Claveau, I Servin, F Delachat, ML Pourteau, ...
Advanced Etch Technology for Nanopatterning VI 10149, 35-47, 2017
12017
PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications
A Sarrazin, P Pimenta-Barros, N Posseme, S Barnola, A Gharbi, ...
2015 China Semiconductor Technology International Conference, 1-3, 2015
12015
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