| Direct measurements of size-independent lithium diffusion and reaction times in individual polycrystalline battery particles J Min, LM Gubow, RJ Hargrave, JB Siegel, Y Li Energy & Environmental Science 16 (9), 3847-3859, 2023 | 16 | 2023 |
| Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO2 Ferroelectric Capacitor Y Choi, C Han, J Shin, S Moon, J Min, H Park, D Eom, J Lee, C Shin Sensors 22 (11), 4087, 2022 | 15 | 2022 |
| Program/Erase Scheme for Suppressing Interface Trap Generation in HfO2-Based Ferroelectric Field Effect Transistor J Min, N Ronchi, SRC McMitchell, B O’Sullivan, K Banerjee, J Van Houdt, ... IEEE Electron Device Letters 42 (9), 1280-1283, 2021 | 14 | 2021 |
| Gate-induced drain leakage (GIDL) in MFMIS and MFIS negative capacitance FinFETs J Min, G Choe, C Shin Current Applied Physics 20 (11), 1222-1225, 2020 | 12 | 2020 |
| MFMIS negative capacitance FinFET design for improving drive current J Min, C Shin Electronics 9 (9), 1423, 2020 | 12 | 2020 |
| Improved remnant polarization of Zr-doped HfO2 ferroelectric film by CF4/O2 plasma passivation Y Choi, H Park, C Han, J Min, C Shin Scientific Reports 12 (1), 16750, 2022 | 8 | 2022 |
| Study of line edge roughness on various types of gate-all-around field effect transistor J Min, C Shin Semiconductor Science and Technology 35 (1), 015004, 2019 | 6 | 2019 |
| Experimental study of endurance characteristics of Al-doped HfO2 ferroelectric capacitor Y Choi, J Shin, S Moon, J Min, C Han, C Shin Nanotechnology 34 (18), 185203, 2023 | 3 | 2023 |
| Endurance of ferroelectric La-doped HfO2 for SFS gate-stack memory devices N Ronchi, S McMitchell, J Min, K Banerjee, G Van den Bosch, C Shin, ... 2020 IEEE International Memory Workshop (IMW), 1-4, 2020 | 2 | 2020 |
| Device Design Guideline for HfO₂-Based Ferroelectric-Gated Nanoelectromechanical System C Yoon, J Min, J Shin, C Shin IEEE Journal of the Electron Devices Society 8, 608-613, 2020 | 1 | 2020 |
| Single‐Particle Electrochemical Cycling Single‐Crystal and Polycrystalline NMC Particles J Min, W Suk, SCY Wong, Y Li Advanced Functional Materials, 2410241, 2024 | | 2024 |
