受强制性开放获取政策约束的文章 - Mingmei Wang了解详情
可在其他位置公开访问的文章：2 篇
Scaling of atomic layer etching of SiO2 in fluorocarbon plasmas: Transient etching and surface roughness
X Wang, M Wang, P Biolsi, MJ Kushner
Journal of Vacuum Science & Technology A 39 (3), 2021
强制性开放获取政策： US National Science Foundation, US Department of Energy
Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O2 and Ar plasmas
G Antoun, T Tillocher, A Girard, P Lefaucheux, J Faguet, H Kim, D Zhang, ...
Journal of Vacuum Science & Technology A 40 (5), 2022
强制性开放获取政策： Agence Nationale de la Recherche
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