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Bonggeun Shong
Bonggeun Shong
在 hongik.ac.kr 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
Atomic Layer Deposition of an Indium Gallium Oxide Thin Film for Thin-Film Transistor Applications
J Sheng, EJ Park, B Shong, JS Park
ACS Applied Materials & Interfaces 9 (28), 23934-23940, 2017
1152017
Area-selective Atomic Layer Deposition using Si Precursors as Inhibitors
R Khan, B Shong, BG Ko, JK Lee, H Lee, JY Park, IK Oh, SS Raya, ...
Chemistry of Materials 30 (21), 7603–7610, 2018
1092018
Finite-size effects in O and CO adsorption for the late transition metals
AA Peterson, LC Grabow, TP Brennan, B Shong, C Ooi, DM Wu, CW Li, ...
Topics in Catalysis 55 (19-20), 1276-1282, 2012
832012
Highly Conductive and Flexible Fiber for Textile Electronics Obtained by Extremely Low-Temperature Atomic Layer Deposition of Pt
J Lee, J Yoon, HG Kim, S Kang, WS Oh, H Algadi, S Al-Sayari, B Shong, ...
NPG Asia Materials 8, e331, 2016
682016
Low temperature atomic layer deposition of SiO2 thin films using di-isopropylaminosilane and ozone
YS Lee, D Choi, B Shong, S Oh, JS Park
Ceramics International 43 (2), 2095-2099, 2017
592017
Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 using Ethanethiol Inhibitor
HG Kim, M Kim, B Gu, MR Khan, BG Ko, S Yasmeen, CS Kim, SH Kwon, ...
Chemistry of Materials 32 (20), 8921–8929, 2020
572020
Atomic and Molecular Adsorption on the Bi(111) Surface: Insights into Catalytic CO2 Reduction
W Oh, CK Rhee, JW Han, B Shong
The Journal of Physical Chemistry C 122 (40), 23084–23090, 2018
532018
Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
S Yeo, DK Nandi, R Rahul, TH Kim, B Shong, Y Jang, JS Bae, JW Han, ...
Applied Surface Science 459, 596-605, 2018
512018
Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices
MZ Ansari, DK Nandi, P Janicek, SA Ansari, R Ramesh, T Cheon, ...
ACS Applied Materials & Interfaces 11 (46), 43608-43621, 2019
492019
Inherently Area-Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity
J Lee, JM Lee, H Oh, C Kim, J Kim, DH Kim, B Shong, TJ Park, WH Kim
Advanced Functional Materials 31 (33), 2102556, 2021
462021
Anti–corrosive FeO decorated CuCo2S4 as an efficient and durable electrocatalyst for hydrogen evolution reaction
ATA Ahmed, AS Ansari, SM Pawar, B Shong, H Kim, H Im
Applied Surface Science 539, 148229, 2021
412021
Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100 °C Using an Aminodisilane Precursor
DH Kim, HJ Lee, H Jeong, B Shong, WH Kim, TJ Park
Chemistry of Materials 31 (15), 5502-5508, 2019
412019
In Vacuo Photoemission Studies of Platinum Atomic Layer Deposition Using Synchrotron Radiation
SM Geyer, R Methaapanon, B Shong, PA Pianetta, SF Bent
The Journal of Physical Chemistry Letters 4 (1), 176-179, 2013
342013
Molecular oxidation of surface –CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study
S Seo, T Nam, HBR Lee, H Kim, B Shong
Applied Surface Science 457, 376-380, 2018
332018
Low-temperature growth of MoS2 on polymer and thin glass substrates for flexible electronics
AT Hoang, L Hu, BJ Kim, TT Ngoc Van, KD Park, Y Jeong, K Lee, S Ji, ...
Nature Nanotechnology 18 (12), 1439-1447, 2023
322023
Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition
IK Oh, WH Kim, L Zeng, J Singh, D Bae, AJM Mackus, JG Song, S Seo, ...
ACS Nano 14 (2), 1757-1769, 2020
292020
Adsorption of gas molecules on graphene, silicene, and germanene: A comparative first-principles study
SS Raya, AS Ansari, B Shong
Surfaces and Interfaces 24, 101054, 2021
282021
Formic acid electrooxidation activity of Pt and Pt/Au catalysts: Effects of surface physical properties and irreversible adsorption of Bi
JK Yoo, M Choi, S Yang, B Shong, HS Chung, Y Sohn, CK Rhee
Electrochimica Acta 273, 307-317, 2018
272018
Low-Temperature Glycolysis of Polyethylene Terephthalate
NH Le, TT Ngoc Van, B Shong, J Cho
ACS Sustainable Chemistry & Engineering 10 (51), 17261-17273, 2022
262022
Atomic Layer Deposition of Ru for Replacing Cu-Interconnects
Y Kotsugi, SM Han, YH Kim, T Cheon, DK Nandi, R Ramesh, NK Yu, ...
Chemistry of Materials 33 (14), 5639–5651, 2021
262021
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