| Sub‐10 nm lithography with self‐assembled monolayers MJ Lercel, HG Craighead, AN Parikh, K Seshadri, DL Allara Applied physics letters 68 (11), 1504-1506, 1996 | 261 | 1996 |
| Self‐assembled monolayer electron beam resist on GaAs RC Tiberio, HG Craighead, M Lercel, T Lau, CW Sheen, DL Allara Applied physics letters 62 (5), 476-478, 1993 | 199 | 1993 |
| Self‐assembled monolayer electron‐beam resists on GaAs and SiO2 MJ Lercel, RC Tiberio, PF Chapman, HG Craighead, CW Sheen, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1993 | 190 | 1993 |
| Electron beam lithography with monolayers of alkylthiols and alkylsiloxanes MJ Lercel, GF Redinbo, FD Pardo, M Rooks, RC Tiberio, P Simpson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 141 | 1994 |
| Electron-beam-induced damage in self-assembled monolayers K Seshadri, K Froyd, AN Parikh, DL Allara, MJ Lercel, HG Craighead The Journal of Physical Chemistry 100 (39), 15900-15909, 1996 | 127 | 1996 |
| Scanning tunneling microscopy based lithography of octadecanethiol on Au and GaAs MJ Lercel, GF Redinbo, HG Craighead, CW Sheen, DL Allara Applied physics letters 65 (8), 974-976, 1994 | 112 | 1994 |
| Pattern transfer of electron beam modified self‐assembled monolayers for high‐resolution lithography MJ Lercel, M Rooks, RC Tiberio, HG Craighead, CW Sheen, AN Parikh, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1995 | 111 | 1995 |
| Borderless contact to diffusion with respect to gate conductor and methods for fabricating JA Bruce, JD Chapple-Sokol, CW Koburger III, MJ Lercel, RW Mann, ... US Patent 6,498,096, 2002 | 68 | 2002 |
| High-selectivity pattern transfer processes for self-assembled monolayer electron beam resists DW Carr, MJ Lercel, CS Whelan, HG Craighead, K Seshadri, DL Allara Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (3 …, 1997 | 58 | 1997 |
| High‐resolution silicon patterning with self‐assembled monolayer resists MJ Lercel, CS Whelan, HG Craighead, K Seshadri, DL Allara Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1996 | 58 | 1996 |
| Plasma etching with self‐assembled monolayer masks for nanostructure fabrication MJ Lercel, HG Craighead, AN Parikh, K Seshadri, DL Allara Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 14 (3 …, 1996 | 50 | 1996 |
| Improved electron‐beam patterning of Si with self‐assembled monolayers CS Whelan, MJ Lercel, HG Craighead, K Seshadri, DL Allara Applied physics letters 69 (27), 4245-4247, 1996 | 41 | 1996 |
| SEMATECH’s EUV program: a key enabler for EUVL introduction S Wurm, CU Jeon, M Lercel Emerging Lithographic Technologies XI 6517, 35-49, 2007 | 37 | 2007 |
| Advanced particle contamination control in EUV scanners M van de Kerkhof, T van Empel, M Lercel, C Smeets, F van de Wetering, ... Extreme Ultraviolet (EUV) Lithography X 10957, 191-203, 2019 | 36 | 2019 |
| Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes MJ Lercel, GF Redinbo, M Rooks, RC Tiberio, HG Craighead, CW Sheen, ... Microelectronic engineering 27 (1-4), 43-46, 1995 | 36 | 1995 |
| Development of stable extreme-ultraviolet sources for use in lithography exposure systems IV Fomenkov, B La Fontaine, D Brown, I Ahmad, P Baumgart, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 11 (2), 021110-021110, 2012 | 31 | 2012 |
| Graded spin-on organic antireflective coating for photolithography CJ Brodsky, SD Burns, DL Goldfarb, M Lercel, DR Medeiros, D Pfeiffer, ... US Patent 7,816,069, 2010 | 30 | 2010 |
| Assessing the viability of multi-electron beam wafer inspection for sub-20nm defects B Thiel, M Lercel, B Bunday, M Malloy Scanning Microscopies 2014 9236, 83-89, 2014 | 28 | 2014 |
| Laser produced plasma EUV sources for device development and HVM DC Brandt, IV Fomenkov, MJ Lercel, BM La Fontaine, DW Myers, ... Extreme Ultraviolet (EUV) Lithography III 8322, 451-459, 2012 | 24 | 2012 |
| LPP source system development for HVM DC Brandt, IV Fomenkov, AI Ershov, WN Partlo, DW Myers, RL Sandstrom, ... Extreme Ultraviolet (EUV) Lithography II 7969, 520-527, 2011 | 23 | 2011 |
