… Embodiments described herein generally relate to methods for patterning a magnetic
stack (eg, a magnetic tunnel junction (MTJ)) by exposing the magnetic stack to an oxidizer-free
gas mixture comprising a hydrogen containing gas to remove at least a portion of the
magnetic stack. … It has been found that patterning a magnetic tunnel junction with an
oxidizer-free gas mixture comprising hydrogen maintains the integrity of the magnetic tunnel
junction without producing harmful conductive residue. … It has been found that patterning …