Excimer laser ablation at 193 nm is used for the generation of a surface relief structure on
fused silica with the aim to fabricate diffractive optical phase elements to be applied for …

F 2-laser ablation at 157 nm was used for generating sub-micron surface relief structures on
fused silica to define binary diffractive phase elements (DPE). A pattern array of 128 x 128 …

Ablation patterning of layered systems enables very precise ablation depth control. Within a
certain process window, the ablation depth does not depend critically on the laser fluence …

Masks for laser processing are generated by laser ablation patterning of dielectric layer
systems. The application of these masks for the rapid fabrication of diffractive optical …

Fluorine laser microfabrication enables direct structuring of diffractive phase elements in
fused silica. These elements are used as beam shapers for the wide wavelength range from …

UV-absorbing silicon suboxide (SiOx, x≈ 1) films can be patterned by excimer laser ablation
and subsequently oxidized to fused silica by thermal annealing. This two-step process …

Diffractive phase elements (DPE), consisting of a patterned UV-transparent layer on a UV-
transparent substrate, were fabricated by three steps. A UV-absorbing SiOx-coating (x< 2) …

We present a novel use of micro-machining with excimer laser: realization of reflective
diffractive optical elements (DOE) for laser marking. The DOE's design is first calculated …

A new method for simple and economic fabrication of diffractive optical elements (DOEs)
with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The …

We propose a low cost technique for the production of diffractive optical elements (DOE).
These elements are devoted to high power lasers beam shaping in the mid-infrared …