Variable gap hard stop design
M Schmotzer, S Whaley - US Patent 10,087,525, 2018 - Google Patents
(57) ABSTRACT A reaction system for processing semiconductor substrates is disclosed.
The reaction system includes a susceptor for holding the substrate as well as a baseplate as …
The reaction system includes a susceptor for holding the substrate as well as a baseplate as …
Gap maintenance for opening to process chamber
CL White, E Shero, J Reed - US Patent 8,216,380, 2012 - Google Patents
(57) ABSTRACT A semiconductor processing apparatus includes a reaction chamber, a
movable susceptor, a movement element, and a control system. The reaction chamber …
movable susceptor, a movement element, and a control system. The reaction chamber …
Alignment fixture for a reactor system
S Ganguli, TR Dunn, A Kimtee - US Patent App. 17/190,615, 2021 - Google Patents
BACKGROUND [0003] Reaction chambers may be used for depositing various material
layers onto semiconductor substrates. A semiconductor may be placed on a susceptor …
layers onto semiconductor substrates. A semiconductor may be placed on a susceptor …
Susceptor heater shim
T Dunn, C White, M Halpin, E Shero… - US Patent 9,202,727, 2015 - Google Patents
(57) ABSTRACT A substrate Supporting assembly in a reaction space includes a heater, a
Substrate Support member, and a shim positioned between the heater and the substrate …
Substrate Support member, and a shim positioned between the heater and the substrate …
Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
S Rajavelu, J Tolle, R McCartney - US Patent App. 15/962,980, 2018 - Google Patents
A semiconductor processing apparatus is disclosed. The semiconductor processing
apparatus may include: a reaction chamber comprising an upper chamber wall and a lower …
apparatus may include: a reaction chamber comprising an upper chamber wall and a lower …
Substrate lift mechanism and reactor including same
E Hill, J Disanto - US Patent 10,770,336, 2020 - Google Patents
(57) ABSTRACT A substrate support assembly suitable for use in a reactor including a
common processing and substrate transfer region is disclosed. The substrate support …
common processing and substrate transfer region is disclosed. The substrate support …
Substrate reactor with adjustable injectors for mixing gases within reaction chamber
R Aggarwal, R Conner, J Disanto… - US Patent …, 2013 - Google Patents
5,698,070 A* 12/1997 Hirano et al.................. 438.729-W4 5.702, 530 A 12, 1997 Sh 1
6,969,875 B2 11/2005 Fitzgerald 57181 A 1, 1998 S Ri 1 7,020,981 B2 4/2006 Shero et al …
6,969,875 B2 11/2005 Fitzgerald 57181 A 1, 1998 S Ri 1 7,020,981 B2 4/2006 Shero et al …
Chamber sealing member
M Halpin, E Shero, C White, F Alokozai… - US Patent …, 2016 - Google Patents
(57) ABSTRACT A reaction chamber including an upper region for processing a Substrate, a
lower region for loading a Substrate, a Susceptor movable within the reaction chamber, a …
lower region for loading a Substrate, a Susceptor movable within the reaction chamber, a …
Hybrid lift pin
UK Rokkam, E Hill - US Patent 11,018,047, 2021 - Google Patents
(57) ABSTRACT A lift pin and a substrate support assembly and reactor including the lift pin
are disclosed. The lift pin includes first section comprising a material having a first …
are disclosed. The lift pin includes first section comprising a material having a first …
Method for supplying gas with flow rate gradient over substrate
D Ishikawa, K Matsushita - US Patent 8,664,627, 2014 - Google Patents
A method for supplying gas over a substrate in a reaction chamber wherein a substrate is
placed on a pedestal, includes: supplying a first gas from a first side of the reaction chamber …
placed on a pedestal, includes: supplying a first gas from a first side of the reaction chamber …